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公开(公告)号：US20220372632A1
公开(公告)日：2022-11-24
申请号：US17633228
申请日：2020-08-04
Applicant: BASF SE
Inventor： Michael LAUTER , Haci Osman GUEVENC , Te Yu WEI , Ching Hsun CHAO
IPC: C23F11/173 , C22C27/04 , H01L21/321
Abstract: The presently claimed invention relates to compositions and methods for inhibition of etching. The presently claimed invention particularly relates to a composition and methods for inhibition of tungsten etching.
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