公开(公告)号：US20220018035A1

公开(公告)日：2022-01-20

申请号：US17312737

申请日：2019-12-10

Applicant: BASF SE

Inventor： Sathana Katayaporn ,  Charlotte Emnet ,  Dieter Mayer ,  Nadine Engelhardt ,  Marco Arnold ,  Lucas Benjamin Henderson ,  Alexander Fluegel

IPC: C25D3/12 ,  C25D7/12 ,  C25D5/18

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.