公开(公告)号：US20180009775A1

公开(公告)日：2018-01-11

申请号：US15546699

申请日：2016-01-29

Applicant: BASF SE

Inventor： Keita TANAKA ,  Yuki MATSUOKA ,  Kazuhiko KUNIMOTO ,  Toshikage ASAKURA ,  Hisatoshi KURA

IPC: C07D307/52 ,  G03F7/004 ,  C07D311/16 ,  G03F7/039 ,  G03F7/038

CPC classification number: C07D307/52 ,  C07D311/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039

Abstract: Compounds of the formula (I) and (IA) wherein X is —O(CO)—; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).