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1.
公开(公告)号:US20240243206A1
公开(公告)日:2024-07-18
申请号:US18686604
申请日:2021-08-27
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Guangcai Yuan , Lingyan Liang , Hongtao Cao , Fengjuan Liu , Ce Ning , Fei Wang , Hehe Hu , Xiaolong Wang
IPC: H01L29/786 , H01L27/12 , H01L29/04 , H01L29/66
CPC classification number: H01L29/7869 , H01L27/1222 , H01L29/04 , H01L29/66742
Abstract: A thin film transistor; includes a substrate; and a semiconductor layer provided on the substrate. The semiconductor layer includes a first surface proximate to the substrate and a second surface away from the substrate, and the semiconductor layer is made of a metal oxide semiconductor material. The semiconductor layer has a channel region; and crystals of metal oxide semiconductor are formed at least in the channel region of the semiconductor layer and proximate to the first surface or the second surface.
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公开(公告)号:US20250142886A1
公开(公告)日:2025-05-01
申请号:US18686647
申请日:2021-08-27
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Guangcai Yuan , Lingyan Liang , Hongtao Cao , Fengjuan Liu , Ce Ning , Fei Wang , Hehe Hu , Hengbo Zhang
Abstract: A thin film transistor includes a substrate; and a semiconductor layer a gate, a source electrode and a drain electrode; which are arranged on the substrate. The semiconductor layer includes a first material layer and a second material layer which are stacked, wherein a material of the first material layer is selected from one of or a combination of first n-type metal oxide semiconductor materials, and a material of the second material layer is selected from one of or a combination of second n-type metal oxide semiconductor materials. A carrier mobility of a first n-type metal oxide semiconductor material is greater than or equal to 40 cm2/Vs, and a second n-type metal oxide semiconductor material is doped with Y, Y being selected from one of or a combination of rare earth elements. The first material layer is closer to the gate than the second material layer.
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