MAGNETIC DEVICE, VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD
    1.
    发明申请
    MAGNETIC DEVICE, VAPOR DEPOSITION DEVICE AND VAPOR DEPOSITION METHOD 有权
    磁性装置,蒸气沉积装置和蒸气沉积方法

    公开(公告)号:US20160251747A1

    公开(公告)日:2016-09-01

    申请号:US14435119

    申请日:2014-08-28

    CPC classification number: C23C14/042 C23C14/12 C23C14/54

    Abstract: The present disclosure provides a magnetic device and a vapor deposition device. The magnetic device is configured to adsorb a metal mask in the vapor deposition device, including: a metal plate; an electromagnet array including a plurality of electromagnets; each of the electromagnets being inserted in the metal plate; a power supply module configured to supply a current; a control module configured to, when adsorbing the metal mask during a vapor deposition process, control the power supply module to supply a direct current to all or some of the plurality of electromagnets and control a direction and a size of the direct current by sending a first control signal to the power supply module.

    Abstract translation: 本公开提供了一种磁性装置和蒸镀装置。 磁性装置构造成在气相沉积装置中吸附金属掩模,包括:金属板; 包括多个电磁体的电磁体阵列; 每个电磁体插入金属板中; 配置为提供电流的电源模块; 控制模块,被配置为当在气相沉积过程中吸附金属掩模时,控制电源模块向多个电磁体中的全部或一些提供直流电流,并通过发送直流电流来控制直流电的方向和尺寸 第一控制信号到电源模块。

Patent Agency Ranking