Abstract:
An array substrate and the method for making the same, and a display device are provided. The method includes step 1, forming a pattern comprising a gate electrode and a gate line on a substrate, and providing photoresist at a position reserved for a first via hole above the gate line in a non-display area; step 2, forming a pattern of functional layers of a thin film transistor (TFT) and a data line on the substrate after the above step; step 3, forming a pattern comprising a first pixel electrode on the substrate after the above steps, and then forming a passivation layer; step 4, removing the photoresist provided above the position reserved for the first via hole and film layer thereabove from the substrate after the above steps, so as to form the first via hole.
Abstract:
The present invention relates to a display panel and a display module, the display panel comprises a display region and a non-display region, and boundaries between the display region and the non-display region comprise at least one arc structure. The technical effects of the present invention are that it is beneficial to design a display module with an arc and narrow frame, which greatly reduces the range of the frame, increases the area that can be displayed, it is more consistent with the natural display contour of the human eye's physiology, with more comfortable, natural and fantastic display effect.
Abstract:
An array substrate and the method for making the same, and a display device are provided. The method includes step 1, forming a pattern comprising a gate electrode and a gate line on a substrate, and providing photoresist at a position reserved for a first via hole above the gate line in a non-display area; step 2, forming a pattern of functional layers of a thin film transistor (TFT) and a data line on the substrate after the above step; step 3, forming a pattern comprising a first pixel electrode on the substrate after the above steps, and then forming a passivation layer; step 4, removing the photoresist provided above the position reserved for the first via hole and film layer thereabove from the substrate after the above steps, so as to form the first via hole.