Light emitting diode display panel with one or more encapsulation layers and manufacturing method thereof

    公开(公告)号:US11538876B2

    公开(公告)日:2022-12-27

    申请号:US16673168

    申请日:2019-11-04

    发明人: Binbin Cao

    摘要: The disclosure provides LED display panel and manufacturing method thereof. LED display panel includes: substrate; LED on substrate; pixel defining layer defining pixel opening on substrate, the LED being within pixel opening; and first encapsulation layer on light emitting side of LED. Portion of first encapsulation layer within pixel opening includes sidewall inclined with respect to substrate, surface of sidewall close to LED includes first portions and second portions alternately arranged in direction away from LED and connected to each other, and inclination angles of first portions with respect to substrate are smaller than those of second portions with respect to substrate. Refractive index of material of first encapsulation layer is greater than refractive index of material of each of layer structures directly on both sides of first encapsulation layer in direction perpendicular to substrate.

    Thin film transistor, fabricating method thereof, display substrate and display apparatus

    公开(公告)号:US11245042B2

    公开(公告)日:2022-02-08

    申请号:US16770252

    申请日:2019-11-07

    发明人: Binbin Cao

    IPC分类号: H01L29/786 H01L29/66

    摘要: A thin film transistor (10) may include a substrate (100); a buffer layer (300) on a surface of the substrate (100); an active layer (400) on a surface of the buffer layer (300) opposite from the substrate (100); a gate insulating layer (500) on a surface of the active layer (400) opposite from the substrate (100), and a gate (600) on a surface of the gate insulating layer (500) opposite from the substrate (100). A width of the active layer (400) may be smaller than a width of the gate (600), and an orthographic projection of the gate (600) on the substrate (100) may cover an orthographic projection of the active layer (400) on the substrate (100).

    Thin film transistor and manufacturing method therefor, array substrate and display device

    公开(公告)号:US11244965B2

    公开(公告)日:2022-02-08

    申请号:US16768232

    申请日:2019-10-25

    发明人: Binbin Cao

    摘要: A thin film transistor, comprising a substrate, an active layer disposed on the substrate, and a source and drain that make electrical contact with the active layer, wherein the source and drain each comprise a first sub-electrode and a second sub-electrode that are stacked along a thickness of the active layer, and the first sub-electrode is closer to the active layer relative to the second sub-electrode. An area of an overlapping region between an orthographic projection of the second sub-electrode of at least one of the source and drain on the substrate and an overlapping region between an orthographic projection of the first sub-electrode of the at least one of the source and the drain on the substrate and the orthographic projection of the active layer on the substrate.

    Thin film transistor and fabrication method thereof, array substrate and display device

    公开(公告)号:US11233155B2

    公开(公告)日:2022-01-25

    申请号:US16067366

    申请日:2017-11-29

    IPC分类号: H01L29/786 H01L29/66

    摘要: A fabrication method of a thin film transistor is provided. The fabrication method includes: forming a gate electrode, an active layer, a drain electrode and a source electrode on the base substrate, in which the active layer includes a channel region and a second portion on both sides of the channel region, and at least a portion of the channel region is overlapped with the gate electrode; and performing a laser annealing process on a side of the base substrate by using a laser, in which the channel region is shielded without being irradiated by the laser, a resistivity of the second portion of the active layer is lower than a resistivity of the channel region, and the second portion of the active layer is connected with the source electrode and the drain electrode. A thin film transistor, an array substrate and a display device are further provided.

    Thin film transistor and method for manufacturing same, array substrate, display panel and display device

    公开(公告)号:US11417769B2

    公开(公告)日:2022-08-16

    申请号:US16063743

    申请日:2017-12-12

    摘要: Provided are a thin film transistor and method for manufacturing the same, array substrate, display panel and display device. The thin film transistor includes: a gate pattern, a gate insulating layer, an active layer pattern, a source pattern and a drain pattern sequentially stacked. At least one of a surface of the source pattern facing the gate insulating layer, a surface of the drain pattern facing the gate insulating layer, and a surface of the gate pattern facing the gate insulating layer is a target surface which can diffusely reflect lights entering the target surface, to prevent part of the lights from entering the active layer pattern. The display device solves the problem of volt-ampere characteristic curve of the active layer pattern being deflected and a normal operation of the thin film transistor being affected, thereby weakening the influence of lights on the normal operation of the thin film transistor.

    Touch substrate, manufacturing method thereof and display device

    公开(公告)号:US11132092B2

    公开(公告)日:2021-09-28

    申请号:US15780342

    申请日:2017-11-20

    发明人: Binbin Cao Ke Cao Li Ai

    IPC分类号: G06F3/044

    摘要: A touch substrate, a manufacturing method thereof and a display device. The touch substrate according to the embodiment of the present disclosure includes: a basal substrate; a touch electrode layer disposed on the basal substrate, the touch electrode layer comprising a plurality of touch electrodes; and a filler disposed between any two adjacent touch electrodes of the touch electrode layer. An orthographic projection of the filler on the basal substrate is at least partially located between orthographic projections of two adjacent touch electrodes on the basal substrate. A refractive index of the filler is n3, a refractive index of the basal substrate is n1, a refractive index of the touch electrode is n2, and |n2−n3|

    THIN FILM TRANSISTOR, FABRICATING METHOD THEREOF, DISPLAY SUBSTRATE AND DISPLAY APPARATUS

    公开(公告)号:US20210249541A1

    公开(公告)日:2021-08-12

    申请号:US16770252

    申请日:2019-11-07

    发明人: Binbin Cao

    IPC分类号: H01L29/786 H01L29/66

    摘要: A thin film transistor (10) may include a substrate (100); a buffer layer (300) on a surface of the substrate (100); an active layer (400) on a surface of the buffer layer (300) opposite from the substrate (100); a gate insulating layer (500) on a surface of the active layer (400) opposite from the substrate (100), and a gate (600) on a surface of the gate insulating layer (500) opposite from the substrate (100). A width of the active layer (400) may be smaller than a width of the gate (600), and an orthographic projection of the gate (600) on the substrate (100) may cover an orthographic projection of the active layer (400) on the substrate (100).