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公开(公告)号：US10209616B2
公开(公告)日：2019-02-19
申请号：US15193992
申请日：2016-06-27
发明人： Chaobo Zhang , Liangliang Liu , Hongwei Tian , Nini Bai , Shuai Han , Feng Kang , Liang Tang , Chuoluopeng , Tiangui Min
摘要： The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.
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公开(公告)号：US20170227842A1
公开(公告)日：2017-08-10
申请号：US15193992
申请日：2016-06-27
发明人： Chaobo ZHANG , Liangliang LIU , Hongwei TIAN , Nini BAI , Shuai HAN , Feng KANG , Liang TANG , Chuoluopeng , Tiangui MIN
CPC分类号： G03F1/52 , G03F1/38 , G03F7/70283 , G03F7/70308 , G03F7/70325
摘要： The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.
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