LOW THERMAL EXPANSION GLASS FOR EUVL APPLICATIONS
    6.
    发明申请
    LOW THERMAL EXPANSION GLASS FOR EUVL APPLICATIONS 有权
    用于EUVL应用的低热膨胀玻璃

    公开(公告)号:US20110052869A1

    公开(公告)日:2011-03-03

    申请号:US12862965

    申请日:2010-08-25

    摘要: A low thermal expansion glass includes a base glass material having a front surface, a back surface, and a thickness and a glass coating material applied on at least the front surface of the base glass material. The base glass material consists essentially 10 wt % to 20 wt % titania and 80 wt % to 90 wt % silica. The glass coating material also consists essentially of titania and silica, but the total amount of titania in the glass coating material is lower than the total amount of titania in the base glass material. A silica-titania glass element suitable for extreme ultraviolet lithography applications consists of 12 wt % to 20 wt % titania and 80 wt % to 88 wt % silica and has a coefficient of thermal expansion of essentially 0 ΔL/L in a temperature range of −20° C. to +100° C.

    摘要翻译: 低热膨胀玻璃包括具有前表面,后表面和厚度的基底玻璃材料,以及施加在基底玻璃材料的至少前表面上的玻璃涂层材料。 基础玻璃材料基本上由10重量%至20重量%的二氧化钛和80重量%至90重量%的二氧化硅组成。 玻璃涂层材料也基本上由二氧化钛和二氧化硅组成,但玻璃涂层材料中二氧化钛的总量低于基础玻璃材料中二氧化钛的总量。 适用于极紫外光刻应用的二氧化硅 - 二氧化钛玻璃元件由12重量%至20重量%的二氧化钛和80重量%至88重量%的二氧化硅组成,并且在温度范围内的热膨胀系数基本为0&Dgr; L / L -20°C至+ 100°C