Memory cell
    3.
    发明申请
    Memory cell 失效
    存储单元

    公开(公告)号:US20060007727A1

    公开(公告)日:2006-01-12

    申请号:US10526382

    申请日:2003-09-12

    IPC分类号: G11C11/00

    摘要: A one-transistor (1T) NVRAM cell that utilizes silicon carbide (SiC) to provide both isolation of non equilibrium charge, and fast and non destructive charging/discharging. To enable sensing of controlled resistance (and many memory levels) rather than capacitance, the cell incorporates a memory transistor that can be implemented in either silicon or Sic. The 1T cell has diode isolation to enable implementation of the architectures used in the present flash memories, and in particular the NOR and the NAND arrays. The 1T cell with diode isolation is not limited to SiC diodes. The fabrication method includes the step of forming a nitrided silicon oxide gate on the Sic substrate and subsequently carrying out the ion implantation and then finishing the formation of a self aligned MOSFET.

    摘要翻译: 使用碳化硅(SiC)的单晶体管(1T)NVRAM电池提供非平衡电荷的隔离以及快速和无损的充电/放电。 为了实现受控电阻(和许多存储器电平)而不是电容的感测,该电池结合了可以在硅或Sic中实现的存储晶体管。 1T单元具有二极管隔离以实现本闪存中使用的架构,特别是NOR和NAND阵列。 具有二极管隔离的1T电池不限于SiC二极管。 该制造方法包括在Sic衬底上形成氮化硅氧化物栅极并随后执行离子注入并随后完成自对准MOSFET的形成的步骤。