公开(公告)号：US20030080289A1

公开(公告)日：2003-05-01

申请号：US10003905

申请日：2001-11-01

申请人： Bechtel BWTX Idaho, LLC

发明人： Jill R. Scott ,  Paul L. Tremblay

IPC分类号： H01J049/04

CPC分类号： H01J49/164

摘要： A laser device includes a target position, an optical component separated a distance J from the target position, and a laser energy source separated a distance H from the optical component, distance H being greater than distance J. A laser source manipulation mechanism exhibits a mechanical resolution of positioning the laser source. The mechanical resolution is less than a spatial resolution of laser energy at the target position as directed through the optical component. A vertical and a lateral index that intersect at an origin can be defined for the optical component. The manipulation mechanism can auto align laser aim through the origin during laser source motion. The laser source manipulation mechanism can include a mechanical index. The mechanical index can include a pivot point for laser source lateral motion and a reference point for laser source vertical motion. The target position can be located within an adverse environment including at least one of a high magnetic field, a vacuum system, a high pressure system, and a hazardous zone. The laser source and an electro-mechanical part of the manipulation mechanism can be located outside the adverse environment. The manipulation mechanism can include a Peaucellier linkage.

摘要翻译： 激光装置包括目标位置，从目标位置分离距离J的光学部件和从光学部件分离距离H的激光能量源，距离H大于距离J.激光源操纵机构显示机械 分辨率定位激光源。 机械分辨率小于通过光学部件指向的目标位置处的激光能量的空间分辨率。 可以为光学部件定义与原点相交的垂直和横向折射率。 在激光源运动过程中，操作机构可以自动对齐激光瞄准原点。 激光源操纵机构可以包括机械指数。 机械指标可以包括激光源横向运动的枢轴点和激光源垂直运动的参考点。 目标位置可以位于包括高磁场，真空系统，高压系统和危险区域中的至少一个的不利环境中。 激光源和操作机构的机电部分可以位于不利环境之外。 操纵机构可以包括Peaucellier连接。