EXPOSURE DEVICE AND EXPOSURE METHOD THEREOF
    6.
    发明申请

    公开(公告)号:US20190049854A1

    公开(公告)日:2019-02-14

    申请号:US15920952

    申请日:2018-03-14

    IPC分类号: G03F7/20

    摘要: Disclosed are an exposure device and an exposure method thereof. The exposure device includes a stage for placing thereon a substrate to be exposed, a mask arranged above the stage and comprising periodical patterns, an exposure light source arranged above the stage and configured to transmit light at a preset wavelength, and a transparent body configured to move horizontally in a preset direction in an exposure area between the mask and the stage while the exposure light source is exposing in operation. The transparent body is so structured that there is a change in light journey of greater than 2p2/λ at each exposure position in the exposure area while an exposure light source is exposing in operation, where p represents a space between periodical patterns in the mask, and λ represents a preset wavelength of light emitted by the exposure light source.

    PEEPING PREVENTION STRUCTURE, DISPLAY DEVICE AND DISPLAY METHOD

    公开(公告)号:US20200209702A1

    公开(公告)日:2020-07-02

    申请号:US16643105

    申请日:2019-04-19

    摘要: A peeping prevention structure, a display device and a display method are provided. The peeping prevention structure includes: a first electrode and a second electrode opposite to each other; a plurality of transparent columnar cavities between the first electrode and the second electrode, wherein a plurality of opening regions are defined between the plurality of transparent columnar cavities, and each of the plurality of transparent columnar cavities is filled with charged light-absorbing particles; wherein, the charged light-absorbing particles are configured to, under a control of an electric field between the first electrode and the second electrode, be uniformly diffused in the transparent columnar cavity or be concentrated at an end of the transparent columnar cavity.