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公开(公告)号:US06899527B2
公开(公告)日:2005-05-31
申请号:US10739948
申请日:2003-12-19
申请人: Bill H Quon , Samuel S. Antley , Andrej S Mitrovic
发明人: Bill H Quon , Samuel S. Antley , Andrej S Mitrovic
CPC分类号: H01J27/143 , H01J37/3266 , H01J37/32834 , H05H1/54
摘要: A closed-drift Hall effect plasma vacuum pump includes one or more pumping conduits which are linked with a radial magnetic field. The magnetic field separates a plasma from a plasma at a higher pressure which is formed by cross-field plasma transport from a plasma processing region.
摘要翻译: 闭合漂移霍尔效应等离子体真空泵包括一个或多个与径向磁场相连的泵送管道。 磁场将等离子体从等离子体处理区域的交叉场等离子体传输形成的较高压力下分离出来。
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公开(公告)号:US06885153B2
公开(公告)日:2005-04-26
申请号:US10721413
申请日:2003-11-26
申请人: Bill H Quon
发明人: Bill H Quon
IPC分类号: H01J37/32 , H01L21/306 , H05H1/46
CPC分类号: H01J37/32935
摘要: A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed within the processing chamber and determining the plasma potential by comparing the determined voltages and equating the highest determined voltage to the plasma potential.
摘要翻译: 用于确定处理室中的等离子体的电位的方法包括确定设置在处理室内的至少两个等离子体产生电极的各等离子体接合表面的电压,并通过比较所确定的电压并将最高确定的电压与 等离子体电位。
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公开(公告)号:US06979954B2
公开(公告)日:2005-12-27
申请号:US10743264
申请日:2003-12-23
申请人: Bill H Quon , Wayne L Johnson
发明人: Bill H Quon , Wayne L Johnson
CPC分类号: H01J37/32834 , H01J37/32082
摘要: A high efficiency plasma pump for use in a plasma processing system that includes a plasma processing device having a first plasma density proximate a processing region and a second plasma density proximate an exit region is disclosed. The plasma pump includes an inter-stage plasma (ISP) source fluidly coupled to the plasma processing device proximate the exit region, the ISP source comprising an inter-stage plasma region having a third plasma density; and a plasma pump fluidly coupled to the ISP, the plasma pump having a fourth plasma density, wherein pumping speed is dependent upon the third plasma density and the fourth plasma density. The ISP source increasing the third plasma density to increase the pumping efficiency.
摘要翻译: 公开了一种用于等离子体处理系统的高效率等离子体泵,其包括具有靠近处理区域的第一等离子体密度和靠近出口区域的第二等离子体密度的等离子体处理装置。 等离子体泵包括在出口区域处流体耦合到等离子体处理装置的级间等离子体(ISP)源,ISP源包括具有第三等离子体密度的级间等离子体区域; 以及流体耦合到ISP的等离子体泵,等离子体泵具有第四等离子体密度,其中泵送速度取决于第三等离子体密度和第四等离子体密度。 ISP源增加第三种等离子体密度以提高泵送效率。
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