Plasma processing apparatus and method
    2.
    发明授权
    Plasma processing apparatus and method 有权
    等离子体处理装置及方法

    公开(公告)号:US06885153B2

    公开(公告)日:2005-04-26

    申请号:US10721413

    申请日:2003-11-26

    申请人: Bill H Quon

    发明人: Bill H Quon

    IPC分类号: H01J37/32 H01L21/306 H05H1/46

    CPC分类号: H01J37/32935

    摘要: A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed within the processing chamber and determining the plasma potential by comparing the determined voltages and equating the highest determined voltage to the plasma potential.

    摘要翻译: 用于确定处理室中的等离子体的电位的方法包括确定设置在处理室内的至少两个等离子体产生电极的各等离子体接合表面的电压,并通过比较所确定的电压并将最高确定的电压与 等离子体电位。

    Inter-stage plasma source
    3.
    发明授权
    Inter-stage plasma source 失效
    级间等离子体源

    公开(公告)号:US06979954B2

    公开(公告)日:2005-12-27

    申请号:US10743264

    申请日:2003-12-23

    IPC分类号: H01J7/24 H01J37/32

    CPC分类号: H01J37/32834 H01J37/32082

    摘要: A high efficiency plasma pump for use in a plasma processing system that includes a plasma processing device having a first plasma density proximate a processing region and a second plasma density proximate an exit region is disclosed. The plasma pump includes an inter-stage plasma (ISP) source fluidly coupled to the plasma processing device proximate the exit region, the ISP source comprising an inter-stage plasma region having a third plasma density; and a plasma pump fluidly coupled to the ISP, the plasma pump having a fourth plasma density, wherein pumping speed is dependent upon the third plasma density and the fourth plasma density. The ISP source increasing the third plasma density to increase the pumping efficiency.

    摘要翻译: 公开了一种用于等离子体处理系统的高效率等离子体泵,其包括具有靠近处理区域的第一等离子体密度和靠近出口区域的第二等离子体密度的等离子体处理装置。 等离子体泵包括在出口区域处流体耦合到等离子体处理装置的级间等离子体(ISP)源,ISP源包括具有第三等离子体密度的级间等离子体区域; 以及流体耦合到ISP的等离子体泵,等离子体泵具有第四等离子体密度,其中泵送速度取决于第三等离子体密度和第四等离子体密度。 ISP源增加第三种等离子体密度以提高泵送效率。