公开(公告)号：US07859760B2

公开(公告)日：2010-12-28

申请号：US12339551

申请日：2008-12-19

申请人： Bob van Someren ,  Pieter Kruit

发明人： Bob van Someren ,  Pieter Kruit

IPC分类号： G02B27/10

CPC分类号： H01J29/488 ,  G02B3/0056 ,  Y10S359/90

摘要： A method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means of the redirecting organ depending on the distance of that beamlet to a central axis of the beam, such that the beamlets converge in a common point with the beamlets from the beam source being focused to foci located in the redirecting organ, and with the beamlets originating from these foci being focused in the common imaging point.

摘要翻译： 一种在操作期间形成光束源的图像的方法提供一个光束，并且其中光束被分割以将光束分成子束，其中使用重定向器件，每个单独的子束通过该重定向器被重定向到预定的程度， 取决于该子束到该光束的中心轴的距离，通过重定向装置重定向每个子束的程度，使得子束在与源光束的子束被聚焦到位于 重定向器官以及源自这些灶的子束被聚焦在共同的成像点中。

公开(公告)号：US20090180192A1

公开(公告)日：2009-07-16

申请号：US12339551

申请日：2008-12-19

申请人： Bob van Someren ,  Pieter Kruit

发明人： Bob van Someren ,  Pieter Kruit

IPC分类号： G02B27/10 ,  H01J3/14

CPC分类号： H01J29/488 ,  G02B3/0056 ,  Y10S359/90

摘要： A method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means of the redirecting organ depending on the distance of that beamlet to a central axis of the beam, such that the beamlets converge in a common point with the beamlets from the beam source being focused to foci located in the redirecting organ, and with the beamlets originating from these foci being focussed in the common imaging point.

摘要翻译： 一种在操作期间形成光束源的图像的方法提供一个光束，并且其中光束被分割以将光束分成子束，其中使用重定向器件，每个单独的子束通过该重定向器被重定向到预定的程度， 取决于该子束到该光束的中心轴的距离，通过重定向装置重定向每个子束的程度，使得子束在与源光束的子束被聚焦到位于 重定向器官以及源自这些焦点的子束聚焦在共同的成像点中。

公开(公告)号：US11549180B2

公开(公告)日：2023-01-10

申请号：US13060435

申请日：2009-08-25

申请人： Diederik Jan Maas ,  Bob van Someren ,  Axel Sebastiaan Lexmond ,  Carolus Ida Maria Antonius Spee ,  Antonie Ellert Duisterwinkel ,  Adrianus Johannes Petrus Maria Vermeer

发明人： Diederik Jan Maas ,  Bob van Someren ,  Axel Sebastiaan Lexmond ,  Carolus Ida Maria Antonius Spee ,  Antonie Ellert Duisterwinkel ,  Adrianus Johannes Petrus Maria Vermeer

IPC分类号： C23C16/455 ,  C23C16/54

摘要： Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.