公开(公告)号：US11549180B2

公开(公告)日：2023-01-10

申请号：US13060435

申请日：2009-08-25

申请人： Diederik Jan Maas ,  Bob van Someren ,  Axel Sebastiaan Lexmond ,  Carolus Ida Maria Antonius Spee ,  Antonie Ellert Duisterwinkel ,  Adrianus Johannes Petrus Maria Vermeer

发明人： Diederik Jan Maas ,  Bob van Someren ,  Axel Sebastiaan Lexmond ,  Carolus Ida Maria Antonius Spee ,  Antonie Ellert Duisterwinkel ,  Adrianus Johannes Petrus Maria Vermeer

IPC分类号： C23C16/455 ,  C23C16/54

摘要： Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.

公开(公告)号：US20100014060A1

公开(公告)日：2010-01-21

申请号：US12483627

申请日：2009-06-12

申请人： Axel Sebastiaan Lexmond ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Leonard Ferdinand Gerard Geers

发明人： Axel Sebastiaan Lexmond ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Leonard Ferdinand Gerard Geers

IPC分类号： G03B27/52 ,  G03B27/32 ,  G01J5/02

CPC分类号： G03F7/70891 ,  G03F7/70341 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.

摘要翻译： 公开了一种光刻投影装置，其包括基板台，投影系统，液体限制结构和热测量系统。 衬底台被配置为支撑衬底。 投影系统被配置为将图案化的辐射束引导到基板的目标部分上。 液体限制结构被配置为至少部分地将浸没液体限制在投影系统和衬底，衬底台之间或两者之间的空间中。 热测量系统包括热敏涂层。 热测量系统被配置为检测与涂层接触的浸液的温度。 还公开了一种热测量系统，包括热测量系统和用于热测量系统的虚拟晶片的计量系统。

公开(公告)号：US20120003396A1

公开(公告)日：2012-01-05

申请号：US13060435

申请日：2009-08-25

申请人： Diederik Jan Maas ,  Bob Van Someren ,  Axel Sebastiaan Lexmond ,  Carolus Ida Maria Antonlus Spee ,  Antonie Ellert Duisterwinkel ,  Adrianus Johannes Petrus Maria Meer

发明人： Diederik Jan Maas ,  Bob Van Someren ,  Axel Sebastiaan Lexmond ,  Carolus Ida Maria Antonlus Spee ,  Antonie Ellert Duisterwinkel ,  Adrianus Johannes Petrus Maria Meer

IPC分类号： C23C16/455 ,  C23C16/48 ,  C23C16/50

CPC分类号： C23C16/45551

摘要： Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.

摘要翻译： 用于原子层沉积在衬底表面上的装置包括前体注入头。 前体注入头包括前体供应源和沉积空间，其在使用中由前体注入头和基底表面限定。 前体注入头被设置用于将前体气体从前体供应源注入到用于接触基底表面的沉积空间中。 该装置设置成在衬底表面的平面中在沉积空间和衬底之间的相对运动。 该装置设置有限制结构，其被布置用于将注入的前体气体限制在与衬底表面相邻的沉积空间。

公开(公告)号：US20110310368A1

公开(公告)日：2011-12-22

申请号：US12996945

申请日：2009-05-20

申请人： Roger Wilhelmus Antonius Henricus Schmitz ,  Tjarko Adriaan Rudolf Van Empel ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Lun Cheng ,  Franciscus Johannes Joseph Janssen ,  William Arie Van Helden ,  Richard Versluis ,  Paulus Bartholomeus Johannes Schaareman ,  Axel Sebastiaan Lexmond ,  Evert Nieuwkoop ,  Charles William Barras Potts ,  Martinus Henricus Johannes Lemmen ,  Frederik Van Der Graaf ,  Mathilde Gertrudis Maria De Kroon ,  Johannes Fransiscus Maria Velthuis

发明人： Roger Wilhelmus Antonius Henricus Schmitz ,  Tjarko Adriaan Rudolf Van Empel ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Lun Cheng ,  Franciscus Johannes Joseph Janssen ,  William Arie Van Helden ,  Richard Versluis ,  Paulus Bartholomeus Johannes Schaareman ,  Axel Sebastiaan Lexmond ,  Evert Nieuwkoop ,  Charles William Barras Potts ,  Martinus Henricus Johannes Lemmen ,  Frederik Van Der Graaf ,  Mathilde Gertrudis Maria De Kroon ,  Johannes Fransiscus Maria Velthuis

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70891 ,  G02B7/008 ,  G03F7/70875 ,  G03F7/709 ,  G03F7/70983 ,  G21K2201/067

摘要： A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.

摘要翻译： 用于热调节光学元件的方法包括用辐射照射光学元件，不用辐射照射光学元件，允许光学元件和保持在调节液体储存器中的调节流体之间的热流动，并且提供流体 调节流体的流动，以将热调节的流体供应到储存器。 在光学元件的照射期间，流体的流量比不照射光学元件时的流体的流量低。

公开(公告)号：US09176398B2

公开(公告)日：2015-11-03

申请号：US12996945

申请日：2009-05-20

申请人： Roger Wilhelmus Antonius Henricus Schmitz ,  Tjarko Adriaan Rudolf Van Empel ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Lun Cheng ,  Franciscus Johannes Joseph Janssen ,  Willem Arie Van Helden ,  Richard Versluis ,  Paulus Bartholomeus Johannes Schaareman ,  Axel Sebastiaan Lexmond ,  Evert Nieuwkoop ,  Charles William Barras Potts ,  Martinus Henricus Johannes Lemmen ,  Frederik Van Der Graaf ,  Mathilde Gertrudis Maria De Kroon ,  Johannes Fransiscus Maria Velthuis

发明人： Roger Wilhelmus Antonius Henricus Schmitz ,  Tjarko Adriaan Rudolf Van Empel ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Lun Cheng ,  Franciscus Johannes Joseph Janssen ,  Willem Arie Van Helden ,  Richard Versluis ,  Paulus Bartholomeus Johannes Schaareman ,  Axel Sebastiaan Lexmond ,  Evert Nieuwkoop ,  Charles William Barras Potts ,  Martinus Henricus Johannes Lemmen ,  Frederik Van Der Graaf ,  Mathilde Gertrudis Maria De Kroon ,  Johannes Fransiscus Maria Velthuis

IPC分类号： G02B7/02 ,  G02B7/18 ,  G03B27/32 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  G02B7/00

CPC分类号： G03F7/70891 ,  G02B7/008 ,  G03F7/70875 ,  G03F7/709 ,  G03F7/70983 ,  G21K2201/067

摘要： A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.

摘要翻译： 用于热调节光学元件的方法包括用辐射照射光学元件，不用辐射照射光学元件，允许光学元件和保持在调节液体储存器中的调节流体之间的热流动，并且提供流体 调节流体的流动，以将热调节的流体供应到储存器。 在光学元件的照射期间，流体的流量比不照射光学元件时的流体的流量低。

公开(公告)号：US08982316B2

公开(公告)日：2015-03-17

申请号：US12483627

申请日：2009-06-12

申请人： Axel Sebastiaan Lexmond ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Leonard Ferdinand Gerard Geers

发明人： Axel Sebastiaan Lexmond ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Leonard Ferdinand Gerard Geers

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70341 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.

摘要翻译： 公开了一种光刻投影装置，其包括基板台，投影系统，液体限制结构和热测量系统。 衬底台被配置为支撑衬底。 投影系统被配置为将图案化的辐射束引导到基板的目标部分上。 液体限制结构被配置为至少部分地将浸没液体限制在投影系统和衬底，衬底台之间或两者之间的空间中。 热测量系统包括热敏涂层。 热测量系统被配置为检测与涂层接触的浸液的温度。 还公开了一种热测量系统，包括热测量系统和用于热测量系统的虚拟晶片的计量系统。