公开(公告)号：US20030234387A1

公开(公告)日：2003-12-25

申请号：US10310099

申请日：2002-12-03

Applicant: Brewer Science, Inc.

Inventor： Rama Puligadda ,  James E. Lamb III ,  Tony D. Flaim

IPC: G03C001/00

CPC classification number: G03F7/091 ,  C08F220/28 ,  C08G59/3218 ,  C08J7/047 ,  C08J2425/00 ,  C08J2433/00 ,  C08J2471/00 ,  C09D163/00 ,  H01L21/0276 ,  H01L21/31144 ,  C08L2666/16

Abstract: Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted ring members. In another embodiment, the polymers further comprise recurring monomers comprising ring members reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.

Abstract translation: 提供抗反射组合物和使用具有低介电常数材料的那些组合物的方法。 在一个实施方案中，组合物包括包含具有未反应的环成员的重复单体的聚合物。 在另一个实施方案中，聚合物还包含包含与光衰减化合物反应以便打开环的环成员的重复单体。 组合物可以施加到电介质层，以便在双镶嵌工艺期间最小化或防止反射，同时阻挡当将有机抗反射涂层施加到低介电常数层时通常发生的通孔或光致抗蚀剂中毒。