N- and p-channel field-effect transistors with single quantum well for complementary circuits
    1.
    发明授权
    N- and p-channel field-effect transistors with single quantum well for complementary circuits 有权
    具有用于互补电路的单量子阱的N沟道场效应晶体管和p沟道场效应晶体管

    公开(公告)号:US08461664B2

    公开(公告)日:2013-06-11

    申请号:US13115453

    申请日:2011-05-25

    IPC分类号: H01L29/20

    摘要: A complementary metal oxide semiconductor (CMOS) device in which a single InxGa1-xSb quantum well serves as both an n-channel and a p-channel in the same device and a method for making the same. The InxGa1-xSb layer is part of a heterostructure that includes a Te-delta doped AlyGa1-ySb layer above the InxGa1-xSb layer on a portion of the structure. The portion of the structure without the Te-delta doped AlyGa1-ySb barrier layer can be fabricated into a p-FET by the use of appropriate source, gate, and drain terminals, and the portion of the structure retaining the Te-delta doped AlyGa1-ySb layer can be fabricated into an n-FET so that the structure forms a CMOS device, wherein the single InxGa1-xSb quantum well serves as the transport channel for both the n-FET portion and the p-FET portion of the heterostructure.

    摘要翻译: 在同一器件中单个In x Ga 1-x Sb量子阱用作n沟道和p沟道的互补金属氧化物半导体(CMOS)器件及其制造方法。 In x Ga 1-x Sb层是异质结构的一部分,其在结构的一部分上包括在In x Ga 1-x Sb层上方的Te-δ掺杂的Al y Ga 1-y Sb。 可以通过使用适当的源极,栅极和漏极端子将不具有Te-δ掺杂的AlI y Ga 1-y Sb阻挡层的部分结构制成p-FET,并且保留Te-δ掺杂的Al y Ga 1 -ySb层可以制造成n-FET,使得该结构形成CMOS器件,其中单个In x Ga 1-x Sb量子阱用作异质结构的n-FET部分和p-FET部分的传输沟道。