公开(公告)号：US20150235822A1

公开(公告)日：2015-08-20

申请号：US14597523

申请日：2015-01-15

Applicant: CANON ANELVA CORPORATION

Inventor： Yoshihiro MUTO ,  Ryuji HIGASHISAKA ,  Satoshi YAMADA

IPC: H01J37/34

CPC classification number: H01J37/3441 ,  B05C13/02 ,  C23C14/042 ,  C23C14/34 ,  C23C14/564 ,  C23C14/568 ,  C23C16/54 ,  H01J37/32651 ,  H01J37/3447

Abstract: The present invention provides a processing apparatus including a supply source including a first supply source and a second supply source arranged to respectively face a first surface of a substrate and a second surface on an opposite side to the first surface and configured to supply a material to apply a process to the substrate, a shield member including a first shield provided around the first supply source and a second shield provided around the second supply source, the first shield and the second shield being arranged to sandwich the substrate, and a moving device configured to move the first shield and the second shield to set one of a close state in which the first shield and the second shield are close to each other and a separate state in which the first shield and the second shield are separate from each other.

Abstract translation: 本发明提供了一种处理装置，其包括：供给源，包括第一供应源和第二供应源，所述第一供应源和第二供应源分别面对基板的第一表面和与所述第一表面相反的一侧上的第二表面，并且被配置为将材料供应到 将过程应用于基板，屏蔽构件，其包括围绕第一电源提供的第一屏蔽件和围绕第二电源设置的第二屏蔽件，第一屏蔽件和第二屏蔽件布置成夹持基板;以及移动装置配置 移动第一屏蔽和第二屏蔽以设置第一屏蔽和第二屏蔽彼此靠近的闭合状态和第一屏蔽和第二屏蔽彼此分开的分离状态之一。