公开(公告)号：US20230271216A1

公开(公告)日：2023-08-31

申请号：US18044901

申请日：2021-08-20

Applicant: CHUGAI RO CO., LTD.

Inventor： Tsutomu NISHIO

IPC: B05C5/02 ,  B05C11/10 ,  B05D1/26

CPC classification number: B05C5/0258 ,  B05C11/10 ,  B05C5/0225 ,  B05D1/26

Abstract: Provided is a coating apparatus where a coated object W is moved relative to an application nozzle 10 located above the coated object, and a coating liquid P is applied to a surface of the coated object via a slit-shaped discharge port 12 at a distal end of the application nozzle. In a coating liquid reservoir 11 storing the coating liquid therein, a coating liquid feeder 14 formed with a coating liquid holding recess 14a in a predetermined pattern shape is rotatably disposed at place above the slit-shaped discharge port. A partition member 13 for dividing the slit-shaped discharge port into plural discharge parts 12a along the longitudinal direction of the slit-shaped discharge port is disposed in the slit-shaped discharge port. The coating liquid feeder 14 is rotated to apply the coating liquid to the surface of the coated object via the discharge parts at places corresponding to the coating liquid holding recess.

公开(公告)号：US20240001396A1

公开(公告)日：2024-01-04

申请号：US18041615

申请日：2021-08-20

Applicant: CHUGAI RO CO., LTD.

Inventor： Tsutomu NISHIO

IPC: B05C5/02 ,  B05B1/04 ,  B05C11/10

CPC classification number: B05C5/0258 ,  B05B1/044 ,  B05C11/1047

Abstract: In a coating device wherein a relative movement between an application nozzle located above a coated object W and the coated object is effected to apply a coating liquid P in a coating liquid reservoir of the application nozzle onto a surface of the coated object via a slit-shaped discharge port, the coating device includes: a shutter member rotatable in the coating liquid reservoir to open or close space between the coating liquid reservoir and the slit-shaped discharge port; and a gas feed regulation means for regulating the pressure on the coating liquid in the coating liquid reservoir, and is characterized in that in a state where the gas feed regulation means maintains the pressure on the coating liquid in the coating liquid reservoir to be at a given level, the shutter member is rotated to open or close space between the coating liquid reservoir and the slit-shaped discharge port.