公开(公告)号：US20170369989A1

公开(公告)日：2017-12-28

申请号：US15630272

申请日：2017-06-22

Applicant: CORNING INCORPORATED

Inventor： Sarko Cherekdjian ,  Benedict Osobomen Egboiyi ,  William Brashear Mattingly, III ,  Michael Yoshiya Nishimoto ,  Toshihiko Ono ,  Parkash Chandra Panda ,  Trevor Edward Wilantewicz

IPC: C23C14/48 ,  H05K5/03 ,  H05K5/00

Abstract: Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.