公开(公告)号：US20220169829A1

公开(公告)日：2022-06-02

申请号：US17535089

申请日：2021-11-24

Applicant: CYTEC INDUSTRIES INC.

Inventor： Jerry Mon-Hei ENG ,  Ram B. GUPTA ,  Xin LI ,  Jian-Yang CHO ,  Kyle O'CONNOR ,  Thomas SANTAMARIA ,  Min WANG

IPC: C08K5/00 ,  C08L23/06 ,  C08L23/12 ,  C08K5/132 ,  C08K5/529 ,  C08K5/3492 ,  C08K5/3435 ,  C08K5/3462

Abstract: Polymer compositions for making stabilized polymeric articles that are resistant to at least one deleterious effect of discoloration, cracking, or crazing upon exposure to UV-C (190-280 nm) light are provided herein, wherein the polymer compositions include: (i) an organic polymeric material; and (ii) a stabilizer composition comprising: an antioxidant selected from the group consisting of hindered phenols, phosphites and phosphonites, and mixtures thereof; and a light stabilizer selected from the group consisting of hindered amine light stabilizers (HALS), UV absorbers (UVA), hindered benzoates, and mixtures thereof, even where barium compounds (such as barium salts) are absent from the stabilizer composition, and with the proviso that the HALS is not bis(2,2,6,6,-tetramethyl-4-piperidyl) sebacate (TINUVIN™ 770) alone. At least one of reduced discoloration, cracking, or crazing upon exposure to UV-C light is associated with the use of the light stabilizer in combination with the antioxidant compared to the antioxidant in the absence of the light stabilizer. Methods of stabilizing organic polymeric materials against the deleterious effects of UV-C light by adding to the organic polymeric materials the antioxidant and the light stabilizer, are also provided.