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1.发明授权公开(公告)号：US11226481B2
公开(公告)日：2022-01-18
申请号：US16142947
申请日：2018-09-26
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
摘要： Methods and apparatuses for designing optical systems are provided. In this case, on a plurality of known optical systems, machine learning is carried out in order to train a computing device. After this training, the computing device can generate a design for an optical system on the basis of parameters describing desired properties of an optical system.
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公开(公告)号：US20190094532A1
公开(公告)日：2019-03-28
申请号：US16142947
申请日：2018-09-26
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
摘要： Methods and apparatuses for designing optical systems are provided. In this case, on a plurality of known optical systems, machine learning is carried out in order to train a computing device. After this training, the computing device can generate a design for an optical system on the basis of parameters describing desired properties of an optical system.
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公开(公告)号：US20240094637A1
公开(公告)日：2024-03-21
申请号：US18516648
申请日：2023-11-21
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/702 , G02B5/0891 , G02B17/0663
摘要： An imaging optical unit comprises a plurality of mirrors for imaging an object field in an object plane into an image field in an image plane. An image-side numerical aperture is greater than 0.55. A ratio between an object/image offset and a meridional transverse direction is at least 0.5. A ratio between a working distance between the object plane and a reflection portion, closest to the object plane, of one of the mirrors and the meridional transverse dimension is at least 0.05. The working distance is at least 270 mm. This can yield an imaging optical unit, the use of which is relatively manageable in a projection exposure apparatus, such as for EUV projection lithography.
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4.发明授权公开(公告)号：US11650510B2
公开(公告)日：2023-05-16
申请号：US17552688
申请日：2021-12-16
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70566 , G02B5/3025 , G02B17/0642 , G03F7/7015
摘要： A projection optical unit for microlithography includes a plurality of mirrors and has a numerical aperture having a value larger than 0.5. The plurality of mirrors includes at least three grazing incidence mirrors, which deflect a chief ray of a central object field point with an angle of incidence of greater than 45°. Different polarized light beams passing the projection optical unit are rotated in their polarization direction by different angles of rotation. The projection optical unit includes first and second groups of mirrors. The second group of mirrors includes the final two mirrors of the plurality of mirrors at the image side. A linear portion in the pupil dependence of the total geometrical polarization rotation of the projection optical unit is less than 20% of a linear portion in the pupil dependence of the geometrical polarization rotation of the second group of mirrors.
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公开(公告)号：US20140038110A1
公开(公告)日：2014-02-06
申请号：US13956770
申请日：2013-08-01
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70233 , G02B17/06 , G02B17/0663 , G03F7/7015
摘要： An imaging optical unit for a projection exposure apparatus serves for imaging an object field in an object plane into an image field in an image plane. The image field is arranged at a field distance from the object plane. The optical unit has a plurality of mirrors. The imaging optical unit has a wavefront aberration over the image field of a maximum of 0.3 nm and an image-side numerical aperture of at least 0.5. The image field in at least one dimension has an extent of at least 10 mm. The result is an imaging optical unit in particular suited as part of an optical system for a projection exposure apparatus for projection lithography.
摘要翻译： 用于投影曝光装置的成像光学单元用于将物平面中的物场成像成像面中的图像场。 图像场被布置在距物体平面的场距离处。 光学单元具有多个反射镜。 成像光学单元在最大为0.3nm的图像场和具有至少0.5的图像侧数值孔径上具有波前像差。 至少一个维度中的图像场具有至少10mm的范围。 结果是成像光学单元特别适用于用于投影光刻的投影曝光设备的光学系统的一部分。
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公开(公告)号：US20240103382A1
公开(公告)日：2024-03-28
申请号：US18523198
申请日：2023-11-29
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70591 , G02B17/0663 , G02B27/4222 , G03F7/70158 , G03F7/702 , G03F7/70233
摘要： An imaging optical unit comprises a plurality of minors for imaging an object field into an image field. The imaging optical unit has an image-side numerical aperture greater than 0.55. Each mirror is configured so that it can be measured by a testing optical unit having at least one DOE with a predetermined maximum diameter for test wavefront generation. For the complete measurement of all reflection surfaces of the minors, a maximum number of DOEs of the testing optical unit and/or a maximum number of DOE test positions of the at least one DOE of the testing optical unit comes into play, which is no more than five times the number of minors in the imaging optical unit. The result is an imaging optical unit in which a testing-optical measurement remains manageable even in the case of a design with an image-side numerical aperture which is relatively large.
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7.发明申请公开(公告)号：US20220107570A1
公开(公告)日：2022-04-07
申请号：US17552688
申请日：2021-12-16
申请人： Carl Zeiss SMT GmbH
摘要： A projection optical unit for microlithography includes a plurality of mirrors and has a numerical aperture having a value larger than 0.5. The plurality of mirrors includes at least three grazing incidence mirrors, which deflect a chief ray of a central object field point with an angle of incidence of greater than 45°. Different polarized light beams passing the projection optical unit are rotated in their polarization direction by different angles of rotation. The projection optical unit includes first and second groups of mirrors. The second group of mirrors includes the final two mirrors of the plurality of mirrors at the image side. A linear portion in the pupil dependence of the total geometrical polarization rotation of the projection optical unit is less than 20% of a linear portion in the pupil dependence of the geometrical polarization rotation of the second group of mirrors.
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公开(公告)号：US09459539B2
公开(公告)日：2016-10-04
申请号：US13956770
申请日：2013-08-01
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70233 , G02B17/06 , G02B17/0663 , G03F7/7015
摘要： An imaging optical unit for a projection exposure apparatus serves for imaging an object field in an object plane into an image field in an image plane. The image field is arranged at a field distance from the object plane. The optical unit has a plurality of mirrors. The imaging optical unit has a wavefront aberration over the image field of a maximum of 0.3 nm and an image-side numerical aperture of at least 0.5. The image field in at least one dimension has an extent of at least 10 mm. The result is an imaging optical unit in particular suited as part of an optical system for a projection exposure apparatus for projection lithography.
摘要翻译： 用于投影曝光装置的成像光学单元用于将物平面中的物场成像成像面中的图像场。 图像场被布置在距物体平面的场距离处。 光学单元具有多个反射镜。 成像光学单元在最大为0.3nm的图像场和具有至少0.5的图像侧数值孔径上具有波前像差。 至少一个维度中的图像场具有至少10mm的范围。 结果是成像光学单元特别适用于用于投影光刻的投影曝光设备的光学系统的一部分。
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