公开(公告)号：US20230400772A1

公开(公告)日：2023-12-14

申请号：US18332192

申请日：2023-06-09

申请人： Carl Zeiss SMT GmbH

发明人： Eugen Doetzel ,  Johannes Kruis ,  Benjamin Sigel ,  Dietmar Duerr ,  Tobias Hegele ,  Alexander Ostendorf ,  Sebastian Henseler ,  Christian Beyrle ,  Christian Werner ,  Alexander Kaniut

IPC分类号： G03F7/20 ,  G21K1/06 ,  G02B27/62

CPC分类号： G03F7/70258 ,  G21K1/06 ,  G02B27/62

摘要： A method for swapping an optical system, such as a DUV mirror, of a projection exposure apparatus, comprises: a) raising the optical system along a centre axis of the optical system so that mount struts of the optical system pass out of contact with frame struts of a frame carrying the optical system; b) rotating the optical system about the centre axis so that the mount struts are arranged between the frame struts; c) lowering the optical system along the centre axis; and d) shifting the optical system perpendicularly to the centre axis so that the optical system is moved out of a housing.