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公开(公告)号：US20210123129A1
公开(公告)日：2021-04-29
申请号：US17055508
申请日：2020-03-11
发明人： Yong ZHENG , Shuai DU , Wenbiao DING
摘要： A mask has a mask pattern region and a non-mask pattern region located at a peripheral of the mask pattern region. The mask pattern region includes at least one effective mask region. In any effective mask region, the mask includes a plurality of evaporation holes and at least one shielding strip. Each shielding strip is located between two adjacent evaporation holes. The mask has at least one welding region in the non-mask pattern region. A thickness of a portion of the mask in the non-mask pattern region and at least in the welding region is greater than a thickness of the shielding strip of the mask in the effective mask region, and the thickness refers to a dimension of the corresponding portion along a direction perpendicular to a plane where the mask is located.
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公开(公告)号：US20220316042A1
公开(公告)日：2022-10-06
申请号：US17425463
申请日：2021-01-12
发明人： Yong ZHENG , Shuai DU , Wenbiao DING , Junxiu DAI , Chunyan GAO
IPC分类号： C23C14/04 , H01L51/56 , B23K26/382
摘要： The present application provides mask plate, fabrication method thereof, and mask plate assembly. The mask plate includes two opening areas being respectively on different sides of mask pattern area along first direction, and two welding areas. One welding area is on a side of one opening area away from the mask pattern area along first direction, and the other welding area is on a side of the other opening area away from mask pattern area along first direction. Evaporation holes are arranged in mask unit, buffer holes are arranged in each opening area, and ratio of maximum dimension of buffer hole in any direction in plane where the mask plate is located to maximum dimension of evaporation hole in the direction is greater than 100. Buffer holes are distributed at equal intervals along a second direction, and second direction is in the plane and is perpendicular to first direction.
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