公开(公告)号：US08013748B2

公开(公告)日：2011-09-06

申请号：US12327218

申请日：2008-12-03

Applicant: Chi-Fen Chen ,  Jen Jui Cheng

Inventor： Chi-Fen Chen ,  Jen Jui Cheng

IPC: G08B17/00 ,  G06F19/00 ,  G01N21/00

CPC classification number: H01L21/67248

Abstract: A method for monitoring the temperature and slope of a wafer is presented, and the steps of the method comprises: (a) providing a cooling machine, a monitoring system, a sensing module, and a wafer; (b) cooling the wafer by the cooling machine; (c) sensing all regions of the wafer by the sensing module, and detecting the temperature and slope of the wafer relative to the cooling machine; (d) if the wafer's temperature is higher than a set temperature, the monitoring system outputs a first alarm signal, if the wafer's slope is greater than a set slope, the monitoring system outputs a second alarm signal.

Abstract translation: 提出了一种用于监测晶片的温度和斜率的方法，该方法的步骤包括：（a）提供冷却机，监测系统，感测模块和晶片; （b）通过冷却机冷却晶片; （c）通过感测模块感测晶片的所有区域，以及检测晶片相对于冷却机的温度和斜率; （d）如果晶片的温度高于设定温度，则监视系统输出第一报警信号，如果晶片的斜率大于设定的斜率，则监视系统输出第二报警信号。

公开(公告)号：US08083463B2

公开(公告)日：2011-12-27

申请号：US12269309

申请日：2008-11-12

Applicant: Jhin-Siang Jhong ,  Jen Jui Cheng ,  Chen Lung Huang

Inventor： Jhin-Siang Jhong ,  Jen Jui Cheng ,  Chen Lung Huang

IPC: H01L21/677

CPC classification number: H01L21/6719 ,  H01L21/67126 ,  H01L21/67742 ,  Y10S414/139

Abstract: A mini clean room for preventing wafer pollution includes a robot arm, a clean room body slidably disposed on the robot arm and at least one lock unit which is rotatably connected with the clean room body. During operation, the robot arm extends out of the clean room body to carry a wafer waiting to be processed, and then moves back into the clean room body which can provide an isolated and protected space for the wafer to avoid that the wafer is polluted. The present invention also discloses a method of using a mini clean room for preventing wafer pollution.

Abstract translation: 用于防止晶片污染的微型洁净室包括机器人臂，可滑动地设置在机器人臂上的洁净室主体和与洁净室主体可旋转地连接的至少一个锁定单元。 在操作期间，机器人手臂从洁净室体延伸出来，以携带待处理的晶片，然后移回到洁净室体内，这可以为晶片提供隔离和保护的空间，以避免晶片被污染。 本发明还公开了一种使用微型洁净室防止晶片污染的方法。