公开(公告)号：US20080134753A1

公开(公告)日：2008-06-12

申请号：US11951986

申请日：2007-12-06

申请人： Chi-Hoon JUN ,  Sang-Choon KO ,  Hyeon-Bong PYO ,  Seon-Hee PARK

发明人： Chi-Hoon JUN ,  Sang-Choon KO ,  Hyeon-Bong PYO ,  Seon-Hee PARK

IPC分类号： G01N7/00

CPC分类号： G01N27/128

摘要： Provided are a micro gas sensor for measuring a gas concentration configured to achieve a high heating and cooling rate of a gas sensitive layer, achieve temperature uniformity, and achieve durability against thermal impact and mechanical impact; and a method for manufacturing the micro gas sensor. The micro gas sensor includes: a vacuum cavity disposed in a substrate; a support layer covering the vacuum cavity; a sealing layer sealing the support layer and the vacuum cavity; a micro heater disposed on the sealing layer; a plurality of electrodes disposed on the micro heater, insulated from the micro heater; and a gas sensitive layer covering the electrodes.

摘要翻译： 提供一种微气体传感器，用于测量构成为实现气敏感层的高加热和冷却速度的气体浓度，实现温度均匀性，并且实现耐热冲击和机械冲击的耐久性; 以及微气体传感器的制造方法。 微气体传感器包括：设置在基板中的真空腔; 覆盖真空腔的支撑层; 密封层，密封支撑层和真空腔; 设置在密封层上的微加热器; 设置在微加热器上的多个电极，与微加热器绝缘; 以及覆盖电极的气敏层。

公开(公告)号：US20080233752A1

公开(公告)日：2008-09-25

申请号：US11927810

申请日：2007-10-30

申请人： Sang-Choon KO ,  Chi-Hoon JUN ,  Hyeon-Bong PYO ,  Seon-Hee PARK

发明人： Sang-Choon KO ,  Chi-Hoon JUN ,  Hyeon-Bong PYO ,  Seon-Hee PARK

IPC分类号： H01L21/306

CPC分类号： B81C1/00801 ,  B81C2201/0133 ,  B81C2201/0136

摘要： Provided is a method for manufacturing a floating structure of a MEMS. The method for manufacturing a floating structure of a microelectromechanical system (MEMS), comprising the steps of: a) forming a sacrificial layer including a thin layer pattern doped with impurities on a substrate; b) forming a support layer on the sacrificial layer; c) forming a structure to be floated on the support layer by using a subsequent process; d) forming an etch hole exposing both side portions of the thin layer pattern; and e) removing the sacrificial layer through the etch hole to form an air gap between the support layer and the substrate.

摘要翻译： 提供了一种用于制造MEMS的浮动结构的方法。 一种用于制造微机电系统（MEMS）的浮动结构的方法，包括以下步骤：a）在衬底上形成包含掺杂有杂质的薄层图案的牺牲层; b）在牺牲层上形成支撑层; c）通过使用随后的方法形成浮在支撑层上的结构; d）形成暴露薄层图案的两侧部分的蚀刻孔; 以及e）通过所述蚀刻孔去除所述牺牲层，以在所述支撑层和所述基底之间形成气隙。