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公开(公告)号:US20050056399A1
公开(公告)日:2005-03-17
申请号:US10892041
申请日:2004-07-15
申请人: Chin-Long Ku , Po-Han Chan
发明人: Chin-Long Ku , Po-Han Chan
IPC分类号: H01L23/467 , H05K7/20
CPC分类号: H01L23/467 , H01L2924/0002 , H01L2924/00
摘要: A radiator includes a heat sink (10), a fan holder (50) and a fan (30). The heat sink includes a heat-absorbing member (12, 18) that defines a cavity (20) in an end thereof. The fan holder includes a central hub (52) secured into the cavity of the heat sink. The fan is positioned to the heat sink via the fan holder.
摘要翻译: 散热器包括散热器(10),风扇支架(50)和风扇(30)。 散热器包括在其末端限定空腔(20)的吸热构件(12,18)。 风扇架包括固定在散热器的空腔中的中心毂(52)。 风扇通过风扇架定位在散热器上。
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公开(公告)号:US07117932B2
公开(公告)日:2006-10-10
申请号:US10892041
申请日:2004-07-15
申请人: Chin-Long Ku , Po-Han Chan
发明人: Chin-Long Ku , Po-Han Chan
IPC分类号: H05K7/20
CPC分类号: H01L23/467 , H01L2924/0002 , H01L2924/00
摘要: A radiator includes a heat sink (10), a fan holder (50) and a fan (30). The heat sink includes a heat-absorbing member (12, 18) that defines a cavity (20) in an end thereof. The fan holder includes a central hub (52) secured into the cavity of the heat sink. The fan is positioned to the heat sink via the fan holder.
摘要翻译: 散热器包括散热器(10),风扇支架(50)和风扇(30)。 散热器包括在其末端限定空腔(20)的吸热构件(12,18)。 风扇架包括固定在散热器的空腔中的中心毂(52)。 风扇通过风扇架定位在散热器上。
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公开(公告)号:US20080138965A1
公开(公告)日:2008-06-12
申请号:US11649892
申请日:2007-01-05
申请人: Cheng-yi Liu , Po-Han Chan , Ching-Liang Lin
发明人: Cheng-yi Liu , Po-Han Chan , Ching-Liang Lin
IPC分类号: H01L21/36
CPC分类号: H01L21/2007
摘要: An amorphous Si (silicon)/Au (gold) eutectic wafer bonding structure is fabricated. An amorphous Si obtained through coating or growth contacts with Au for bonding. The bonding layer is a Si/Au eutectic layer. Si is prevented from being precipitated. The bonding structure has a fast reaction ratio and a uniformed reaction. Thus, an electrical device has an improved electricity and reliability.
摘要翻译: 制造非晶Si(硅)/ Au(金)共晶晶片接合结构。 通过涂覆或生长获得的非晶硅与Au接触以进行接合。 结合层是Si / Au共晶层。 防止了Si沉淀。 键合结构具有快速的反应比和均匀的反应。 因此,电气设备具有改善的电力和可靠性。
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公开(公告)号:US07507636B2
公开(公告)日:2009-03-24
申请号:US11649892
申请日:2007-01-05
申请人: Cheng-yi Liu , Po-Han Chan , Ching-Liang Lin
发明人: Cheng-yi Liu , Po-Han Chan , Ching-Liang Lin
IPC分类号: H01L21/00
CPC分类号: H01L21/2007
摘要: An amorphous Si (silicon)/Au (gold) eutectic wafer bonding structure is fabricated. An amorphous Si obtained through coating or growth contacts with Au for bonding. The bonding layer is a Si/Au eutectic layer. Si is prevented from being precipitated. The bonding structure has a fast reaction ratio and a uniformed reaction. Thus, an electrical device has an improved electricity and reliability.
摘要翻译: 制造非晶Si(硅)/ Au(金)共晶晶片接合结构。 通过涂覆或生长获得的非晶硅与Au接触以进行接合。 结合层是Si / Au共晶层。 防止了Si沉淀。 键合结构具有快速的反应比和均匀的反应。 因此,电气设备具有改善的电力和可靠性。
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公开(公告)号:US20080113463A1
公开(公告)日:2008-05-15
申请号:US11645165
申请日:2006-12-26
申请人: Cheng-yi Liu , Ching-Liang Lin , Po-Han Chan
发明人: Cheng-yi Liu , Ching-Liang Lin , Po-Han Chan
IPC分类号: H01L33/00
CPC分类号: H01L33/0079 , H01L33/22
摘要: A laser is used in fabricating a thin film gallium nitride (GaN) light emitting diode (LED). The laser has a wave length to be absorbed by GaN. The laser is used to define a GaN grain. And the laser is used to lift off a substrate after obtaining a bonding layer of GaN. Fabrication procedure is thus simplified.
摘要翻译: 激光用于制造薄膜氮化镓(GaN)发光二极管(LED)。 激光器具有被GaN吸收的波长。 激光用于限定GaN晶粒。 并且激光器在获得GaN的结合层之后用于剥离衬底。 因此,制造过程被简化。
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