公开(公告)号：US20110222039A1

公开(公告)日：2011-09-15

申请号：US13044242

申请日：2011-03-09

申请人： Christiaan Louis VALENTIN ,  Antonius Franciscus Johannes DE GROOT ,  Robert-Han MUNNIG SCHMIDT ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Bartholomeus Catharina Thomas VAN BREE

发明人： Christiaan Louis VALENTIN ,  Antonius Franciscus Johannes DE GROOT ,  Robert-Han MUNNIG SCHMIDT ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Bartholomeus Catharina Thomas VAN BREE

IPC分类号： G03B27/52

CPC分类号： G03F7/70266 ,  G03B27/52 ,  G03F7/70258 ,  G03F7/703 ,  G03F7/70783

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 投影系统的光学元件是可调节的。 光刻设备包括控制可调光学元件的控制器。 控制器布置成驱动光学元件，以便至少部分地补偿由图案形成装置的弯曲引起的放大倍数。