Hat form
    4.
    外观设计
    Hat form 有权

    公开(公告)号:USD1012439S1

    公开(公告)日:2024-01-30

    申请号:US29792103

    申请日:2022-03-03

    Applicant: Cricut, Inc.

    Abstract: FIG. 1 is a front, left, bottom isometric view of the hat form;
    FIG. 2 is a front elevation view of the hat form, the rear elevation view being a mirror image of the front elevation view;
    FIG. 3 is a left side elevation view of the hat form, the right side elevation view being a mirror image of the left side elevation view;
    FIG. 4 is a top plan view of the hat form; and,
    FIG. 5 is a bottom plan view of the hat form.
    The shade lines in the figures show contour and not surface ornamentation. The broken lines in the figures show claimed stitching.

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