公开(公告)号：US11349273B2

公开(公告)日：2022-05-31

申请号：US16962434

申请日：2018-12-17

申请人： Cymer, LLC

发明人： Edward Siqi Luo ,  Richard Carl Ujazdowski ,  Shuang Xu

IPC分类号： H01S3/22 ,  H01S3/038 ,  H01S3/032 ,  H01S3/097 ,  H01S3/106 ,  H01S3/225 ,  H01S3/08

摘要： Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components.

公开(公告)号：US20210066880A1

公开(公告)日：2021-03-04

申请号：US16962434

申请日：2018-12-17

申请人： Cymer, LLC

发明人： Edward Siqi Luo ,  Richard Carl Ujazdowski ,  Shuang Xu

IPC分类号： H01S3/097 ,  G03F7/20 ,  H01S3/225 ,  H01S3/106 ,  H01S3/032

摘要： Disclosed is a laser discharge chamber in which useful lifetime is extended by local electrical tuning using one or a combination of design of the chamber internal geometry, placement and distribution of components within the chamber such as electrodes, current returns, and capacitors, and selective electrical isolation of portions of the components