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公开(公告)号：US11578028B2
公开(公告)日：2023-02-14
申请号：US16334589
申请日：2017-08-22
发明人： Masatake Joyabu , Kei Shiohara , Asako Ogasawara , Takuro Kimura , Chi Tao
IPC分类号： C07C33/30 , C07C43/166 , C08F2/26 , C08F2/30 , C08F216/10 , C08F12/08 , C08F20/06 , C08F20/18 , C08K5/06
摘要： The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.
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公开(公告)号：US10940453B2
公开(公告)日：2021-03-09
申请号：US16334203
申请日：2017-08-22
发明人： Masatake Joyabu , Kei Shiohara , Asako Ogasawara , Takuro Kimura , Chi Tao
IPC分类号： C08F2/26 , C08F2/30 , B01F17/00 , C08L71/02 , C09D7/45 , C09J11/08 , D21H17/53 , D21H17/36 , D21H21/08 , C08F2/24 , C08K5/06 , C08F20/00
摘要： The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
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