公开(公告)号：US20200263294A1

公开(公告)日：2020-08-20

申请号：US16619741

申请日：2018-06-08

Applicant: DIAM CONCEPT

Inventor： Alix GICQUEL ,  Olivier DUIGOU ,  Thomas BIEBER

IPC: C23C16/27 ,  C23C16/52 ,  C30B25/16 ,  C30B29/04

Abstract: The invention relates to a method (100) for monitoring the growth conditions of a microwave plasma-assisted deposition for diamond manufacture, said method being implemented by a monitoring device (10) comprising at least one digital image capture means (11), one digital image processing module (12), and one data processing module (13), said method including the steps of: capturing (110) a digital color image of at least one growing diamond, using the digital image capturing means (11), extracting (120) color characteristic values from at least one area of the captured digital image, by the digital image processing module (12), and analyzing (130), by the data processing module (13), the extracted color characteristic values to detect a variation during the microwave plasma-assisted deposition.