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公开(公告)号：US11859279B2
公开(公告)日：2024-01-02
申请号：US16467828
申请日：2017-12-08
Applicant: DIAM CONCEPT
Inventor： Alix Gicquel , François Des Portes
IPC: C23C16/511 , C23C16/27 , C23C16/455 , C23C16/458 , C23C16/46 , C30B25/08 , C30B25/12 , C30B25/14 , C30B25/20 , C30B29/04 , H01J37/32
CPC classification number: C23C16/274 , C23C16/4586 , C23C16/45563 , C23C16/466 , C23C16/511 , C30B25/08 , C30B25/12 , C30B25/14 , C30B25/20 , C30B29/04 , H01J37/3244 , H01J37/32201 , H01J37/32247 , H01J37/32458 , H01J37/32513 , H01J37/32715 , H01J37/32724 , H01J37/32834 , H01J2237/20214 , H01J2237/20235 , H01J2237/332
Abstract: The invention relates to a microwave plasma-assisted deposition modular reactor for manufacturing synthetic diamond. The reactor has at least three modulation elements selected from: a crown adapted to be positioned between a first enclosure part and a second enclosure part; a substrate holder module mobile in vertical translation and in rotation, in contact with a quarter-wave and including at least one fluid cooling system; a tray mobile in vertical translation in order to change the shape and volume of the resonant cavity and including through openings allowing the gases to pass; a gas distribution module, including a removable gas distribution plate comprising an inner surface, an outer surface, and a plurality of gas distribution nozzles forming channels between said surfaces capable of conducting a gas flow, and a support device connected to a cooling system and adapted to accommodate the removable gas distribution plate; and a substrate cooling control module including a removable thermal resistance gas injection device.
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公开(公告)号：US20200263294A1
公开(公告)日：2020-08-20
申请号：US16619741
申请日：2018-06-08
Applicant: DIAM CONCEPT
Inventor： Alix GICQUEL , Olivier DUIGOU , Thomas BIEBER
Abstract: The invention relates to a method (100) for monitoring the growth conditions of a microwave plasma-assisted deposition for diamond manufacture, said method being implemented by a monitoring device (10) comprising at least one digital image capture means (11), one digital image processing module (12), and one data processing module (13), said method including the steps of: capturing (110) a digital color image of at least one growing diamond, using the digital image capturing means (11), extracting (120) color characteristic values from at least one area of the captured digital image, by the digital image processing module (12), and analyzing (130), by the data processing module (13), the extracted color characteristic values to detect a variation during the microwave plasma-assisted deposition.
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公开(公告)号：US20210087676A1
公开(公告)日：2021-03-25
申请号：US16467828
申请日：2017-12-08
Applicant: DIAM CONCEPT
Inventor： Alix GICQUEL , François DES PORTES
IPC: C23C16/27 , C23C16/455 , C23C16/458 , C23C16/46 , C30B25/14 , C30B25/20 , C30B25/12 , C30B25/08 , C30B29/04 , C23C16/511 , H01J37/32
Abstract: The invention relates to a microwave plasma-assisted deposition modular reactor for manufacturing synthetic diamond. The reactor has at least three modulation elements selected from: a crown adapted to be positioned between a first enclosure part and a second enclosure part; a substrate holder module mobile in vertical translation and in rotation, in contact with a quarter-wave and including at least one fluid cooling system; a tray mobile in vertical translation in order to change the shape and volume of the resonant cavity and including through openings allowing the gases to pass; a gas distribution module, including a removable gas distribution plate comprising an inner surface, an outer surface, and a plurality of gas distribution nozzles forming channels between said surfaces capable of conducting a gas flow, and a support device connected to a cooling system and adapted to accommodate the removable gas distribution plate; and a substrate cooling control module including a removable thermal resistance gas injection device.
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