公开(公告)号：US20140036946A1

公开(公告)日：2014-02-06

申请号：US14112458

申请日：2012-04-18

申请人： Daniel Albach ,  Jean-Christophe Chanteloup ,  Antonio Lucianetti ,  Thierry Novo ,  Bernard Vincent

发明人： Daniel Albach ,  Jean-Christophe Chanteloup ,  Antonio Lucianetti ,  Thierry Novo ,  Bernard Vincent

IPC分类号： H01S5/024

CPC分类号： H01S5/02407 ,  H01S3/0404 ,  H01S3/042 ,  H01S3/0604 ,  H01S3/0621 ,  H01S3/0625 ,  H01S3/08072

摘要： A device is provided for managing heat in an optical element, including: the optical element; a material at a reference temperature; and an intermediate gas layer located directly between the reference-temperature material and the optical element, the intermediate gas layer being located on at least a portion of the thickness thereof in a temporary diffusion state defined by a thickness of the intermediate gas layer, such that the ratio of the mean free path of the gas molecules in the intermediate gas layer over said thickness is between 0.1 and 10. The thickness of the intermediate gas layer is between 10 μm and 5 mm. A corresponding heat-management method is implemented in the device for managing the temperature of an optical element.

摘要翻译： 提供了一种用于管理光学元件中的热量的装置，包括：光学元件; 在参考温度下的材料; 以及直接位于参考温度材料和光学元件之间的中间气体层，中间气体层位于其厚度的至少一部分上，处于由中间气体层的厚度限定的临时扩散状态，使得 中间气体层中的气体分子在所述厚度上的平均自由程的比例在0.1和10之间。中间气体层的厚度在10um和5mm之间。 在用于管理光学元件的温度的装置中实现相应的热管理方法。

公开(公告)号：US09293891B2

公开(公告)日：2016-03-22

申请号：US14112458

申请日：2012-04-18

申请人： Daniel Albach ,  Jean-Christophe Chanteloup ,  Antonio Lucianetti ,  Thierry Novo ,  Bernard Vincent

发明人： Daniel Albach ,  Jean-Christophe Chanteloup ,  Antonio Lucianetti ,  Thierry Novo ,  Bernard Vincent

IPC分类号： H01S5/024 ,  H01S3/04 ,  H01S3/042 ,  H01S3/06 ,  H01S3/08

CPC分类号： H01S5/02407 ,  H01S3/0404 ,  H01S3/042 ,  H01S3/0604 ,  H01S3/0621 ,  H01S3/0625 ,  H01S3/08072

摘要： A device is provided for managing heat in an optical element, including: the optical element; a material at a reference temperature; and an intermediate gas layer located directly between the reference-temperature material and the optical element, the intermediate gas layer being located on at least a portion of the thickness thereof in a temporary diffusion state defined by a thickness of the intermediate gas layer, such that the ratio of the mean free path of the gas molecules in the intermediate gas layer over said thickness is between 0.1 and 10. The thickness of the intermediate gas layer is between 10 μm and 5 mm. A corresponding heat-management method is implemented in the device for managing the temperature of an optical element.

摘要翻译： 提供了一种用于管理光学元件中的热量的装置，包括：光学元件; 在参考温度下的材料; 以及直接位于参考温度材料和光学元件之间的中间气体层，中间气体层以其中间气体层的厚度限定的临时扩散状态位于其厚度的至少一部分上，使得 中间气体层中的气体分子在所述厚度上的平均自由程的比例为0.1-10。中间气体层的厚度在10μm和5mm之间。 在用于管理光学元件的温度的装置中实现相应的热管理方法。