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公开(公告)号：US5866871A
公开(公告)日：1999-02-02
申请号：US847434
申请日：1997-04-28
Applicant: Daniel Birx
Inventor： Daniel Birx
CPC classification number: H05G2/003 , F03H1/0087 , H01J27/04 , H05G2/005 , H05H1/54
Abstract: A high pulse repetition rate (PRF) plasma gun is provided which gun inlets a selected propellant gas into a column formed between a center electrode and a coaxial outer electrode, utilizes a solid state high repetition rate pulse driver to provide a voltage across the electrodes and provides a plasma initiator at the base of the column, which is normally operative when the driver is fully charged. The plasma expands from the base end of the column and off the exit end thereof. When used as a thruster, for example in space applications, the driver voltage and electrode lengths are selected such that the plasma for each pulse exits the column at approximately the same time the voltage across the electrode reaches zero, thereby maximizing the thrust. When used as a radiation source, and in particular a source for radiation in the EUV band, the voltage and electrode length are selected such that the plasma exits the column when the current is maximum, which occur when the driver is roughly half discharged. The plasma is magnetically pinched as it exits the column, thereby raising the plasma temperature to provide thermal radiation at desired wavelengths. The plasma gun parameters can be selected to achieve a desired wavelength within the EUV band. The plasma gun of this invention, which is capable of operating at PRF in the range of approximately 100 Hz to in excess of 5,000 Hz, may also be used in other applications, and in particular in applications where low pressure near-vacuum environments are possible.
Abstract translation: 提供了一种高脉冲重复率（PRF）等离子体枪，其将选定的推进剂气体喷射入形成在中心电极和同轴外部电极之间的列中，利用固态高重复率脉冲驱动器提供横跨电极的电压， 在柱的底部提供等离子体引发剂，当驱动器完全充电时，其通常是可操作的。 等离子体从塔的基端延伸并离开其出口端。 当用作推进器时，例如在空间应用中，选择驱动器电压和电极长度，使得每个脉冲的等离子体几乎在电极两端的电压达到零的同时离开列，从而使推力最大化。 当用作辐射源，特别是用于EUV波段中的辐射源时，选择电压和电极长度，使得当电流最大时等离子体离开塔，这在驾驶员大致一半排出时发生。 等离子体在离开色谱柱时被磁力挤压，从而提高等离子体温度以提供所需波长的热辐射。 可以选择等离子体枪参数以在EUV频带内实现期望的波长。 能够在大约100Hz至超过5000Hz的范围内在PRF操作的本发明的等离子体枪也可以用于其它应用中，特别是在低压近真空环境可能的应用中 。
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公开(公告)号：US6084198A
公开(公告)日：2000-07-04
申请号：US187436
申请日：1998-11-06
Applicant: Daniel Birx
Inventor： Daniel Birx
CPC classification number: H05G2/003 , F03H1/0087 , H01J27/04 , H05G2/005 , H05H1/54
Abstract: A high pulse repetition frequency (PRF) plasma gun is provided, which gun inlets a selected propellant gas into a column formed between a center electrode and a coaxial outer electrode, utilizes a solid state high repetition rate pulse driver to provide a voltage across the electrodes and provides a plasma initiator at the base of the column, which is normally operative when the driver is fully charged. For preferred embodiments, the initiator includes RF driven electrodes. The plasma expands from the base end of the column and off the exit end thereof. When used as a thruster, for example in space applications, the driver voltage and electrode lengths are selected such that the plasma for each pulse exits the column at approximately the same time the voltage across the electrodes reaches zero, thereby maximizing the thrust. When used as a radiation source, the voltage and electrode length are selected such that the plasma exits the column when the current is maximum. The plasma is magnetically pinched as it exits the column, thereby raising the plasma temperature, energizing an element in gas state applied to the pinch, for example through the center electrode to provide radiation at a desired wavelength. The plasm gun parameters can be selected to achieve a desired wavelength, which may for example be within the EUV band. In particular, the pinch temperature is preferable high enough to ionize a significant portion of the gas applied to the pinch to its single election state, thereby producing radiation at the wavelength having maximum intensity If a longer, lower-intensity wavelength is desired, filtering of at least higher intensity, shorter wavelengths concurrently generated is desirable. Temperature at the pinch can also be selected to control the type of emission to minimize output angle of the radiation. The plasma gun of this invention, which is capable of operating at PRFs in the range of approximately 100 Hz to in excess of 5,000 Hz, may also be used in other applications.
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公开(公告)号：US06300720B1
公开(公告)日：2001-10-09
申请号：US09283135
申请日：1999-03-31
Applicant: Daniel Birx
Inventor： Daniel Birx
IPC: H01J724
CPC classification number: H05H1/54 , F03H1/0087 , H01J27/04 , H05G2/003 , H05G2/005
Abstract: A high pulse repetition frequency (PRF) plasma gun is provided, which gun inlets a selected propellant gas into a column formed between a center electrode and a coaxial outer electrode, utilizes a solid state high repetition rate pulse driver to provide a voltage across the electrodes and provides a plasma initiator at the base of the column, which is normally operative when the driver is fully charged. For preferred embodiments, the initiator includes a sold state simulated RF driver, the outputs from which are applied to electrodes affixed in an insulator and producing a high voltage field at a surface of the insulator which forms part of the base end of the column. The plasma expands from the base end of the column and off the exit end thereof. When used as a thruster, for example in space applications, the driver voltage and electrode lengths are selected such that the plasma for each pulse exits the column at approximately the same time the voltage across the electrodes reaches zero, thereby maximizing the thrust. When used as a radiation source, the voltage and electrode length are selected such that the plasma exits the column when the current is maximum. The plasma is magnetically pinched as it exits the, column, thereby raising the plasma temperature, energizing an element in fluid state applied to the pinch, for example through the center electrode, to provide radiation at a desired wavelength. The element may also be applied to the pinch by forming at least one of the center and outer electrodes of a sintered powder refractory metal, the element in fluid form being wicked into the electrode. The plasm gun parameters can be selected to achieve a desired wavelength, which may for example be within the EUV or VUV band. The pulse driver preferably provides a high voltage spike followed by a lower voltage, longer duration sustainer signal, most of the driver energy being provided by the sustainer signal. The plasma gun of this invention, which is capable of operating at PRFs in the range of approximately 100 Hz to in excess of 5,000 Hz, may also be used in other applications.
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公开(公告)号：US06172324B2
公开(公告)日：2001-01-09
申请号：US09352571
申请日：1999-07-13
Applicant: Daniel Birx
Inventor： Daniel Birx
IPC: B23K1000
Abstract: This invention relates to a plasma focus source for generating radiation at a selected wavelength, the invention involving producing a high energy plasma sheathe which moves down an electrode column at high speed and is pinched at the end of the column to form a very high temperature spot. An ionizable gas introduced at the pinch can produce radiation at the desired wavelength. In order to prevent separation of the plasma sheathe from the pinch, and therefore to prolong the pinch and prevent potentially damaging restrike, a shield of a high temperature nonconducting material is positioned a selected distance from the center electrode and shaped to redirect the plasma sheathe to the center electrode, preventing separation thereof. An opening is provided in the shield to permit the desired radiation to pass substantially unimpeded.
Abstract translation: 本发明涉及一种用于产生选定波长的辐射的等离子体聚焦源，本发明涉及生产高能等离子体护套，其以高速向下移动电极柱，并且被夹在柱的端部以形成非常高的温度点 。 在夹点处引入的可电离气体可产生所需波长的辐射。 为了防止等离子体护套与夹点分离，因此延长夹持并防止潜在的破坏性再起弧，高温不导电材料的屏蔽物被定位成距离中心电极选定的距离并成形为将等离子体护套重定向到 中心电极，防止其分离。 在屏蔽件中设有开口以允许所需辐射基本上不受阻碍地通过。
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