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    Treatment of effluent from a substrate processing chamber
    4.
    发明授权
    Treatment of effluent from a substrate processing chamber 失效
    处理底物处理室的流出物

    公开(公告)号：US07160521B2

    公开(公告)日：2007-01-09

    申请号：US10342121

    申请日：2003-01-13

    申请人： Peter Porshnev ,  Sebastien Raoux ,  Mike Woolston ,  Christopher L. Aardahl ,  Rick J. Orth ,  Kenneth G. Rappe

    发明人： Peter Porshnev ,  Sebastien Raoux ,  Mike Woolston ,  Christopher L. Aardahl ,  Rick J. Orth ,  Kenneth G. Rappe

    IPC分类号： B01J19/08

    CPC分类号： B01D53/68 ,  B01D53/70 ,  B01D2259/818

    摘要： A substrate processing apparatus has a process chamber and an effluent treatment reactor. The process chamber has a substrate support, a process gas supply, a gas energizer, and an exhaust conduit. The effluent treatment reactor has an effluent inlet to receive effluent from the exhaust conduit of the process chamber, a plasma cell having one or more electrodes electrically connected to a voltage source adapted to electrically bias the electrodes to couple energy to effluent received in the plasma cell, a scrubbing cell coaxially exterior to the plasma cell, the scrubbing cell having a scrubbing fluid inlet to introduce scrubbing fluid into effluent in the scrubbing cell and a scrubbing fluid outlet, and an effluent outlet to release the treated effluent.

    摘要翻译： 基板处理装置具有处理室和流出物处理反应器。 处理室具有基板支撑件，工艺气体供应器，气体增压器和排气导管。 流出物处理反应器具有用于接收来自处理室的排气管道的流出物的流出物入口，具有电连接到电压源的一个或多个电极的等离子体电池，该电压源适于电气偏置电极以将能量耦合到在等离子体电池中接收的流出物 洗涤单元，其具有洗涤流体入口，用于将洗涤流体引入洗涤池中的流出物和洗涤流体出口，以及流出物出口以释放经处理的流出物。