公开(公告)号：US20080305431A1

公开(公告)日：2008-12-11

申请号：US12136437

申请日：2008-06-10

申请人： David B. Powell ,  Ahmad A. Naiini ,  N. Jon Metivier ,  II'ya Rushkin ,  Richard Hopla

发明人： David B. Powell ,  Ahmad A. Naiini ,  N. Jon Metivier ,  II'ya Rushkin ,  Richard Hopla

IPC分类号： G03F7/004 ,  B32B9/04 ,  H01L29/12

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/023 ,  G03F7/0233 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0751 ,  Y10T428/12528

摘要： A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2  VI in which each of Y, V1, and V2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.

摘要翻译： 一种预处理组合物，其特征在于：（a）至少一种具有结构VI的化合物<？in-line-formula description =“In-line formula”end =“lead”？> V1-Y-V2 VI < 描述=“在线公式”end =“tail”？>其中Y，V1和V2中的每一个在说明书中定义; （b）至少一种有机溶剂，和任选地（c）至少一种粘合促进剂; 其中组合物中存在的结构VI化合物的量在将光敏组合物涂覆在基材上并且涂覆的基材被加工以在其上形成图像时有效抑制残留物形成。