APPARATUS AND PROCESS FOR ATOMIC OR MOLECULAR LAYER DEPOSITION ONTO PARTICLES DURING PNEUMATIC TRANSPORT

    公开(公告)号:US20210102288A1

    公开(公告)日:2021-04-08

    申请号:US17099565

    申请日:2020-11-16

    Abstract: The invention provides a process for depositing a coating onto particles being pneumatically transported in a tube. The process comprising the steps of providing a tube having an inlet opening and an outlet opening; feeding a carrier gas entraining particles into the tube at or near the inlet opening of the tube to create a particle flow through the tube; and injecting a first self-terminating reactant into the tube via at least one injection point downstream from the inlet opening of the tube for reaction with the particles in the particle flow. The process is suitable for atomic layer deposition and molecular layer deposition. An apparatus for carrying out the process is also disclosed.

    APPARATUS AND PROCESS FOR ATOMIC OR MOLECULAR LAYER DEPOSITION ONTO PARTICLES DURING PNEUMATIC TRANSPORT

    公开(公告)号:US20180073138A1

    公开(公告)日:2018-03-15

    申请号:US15813840

    申请日:2017-11-15

    CPC classification number: C23C16/4417 C23C16/45525 C23C16/45551

    Abstract: The invention provides a process for depositing a coating onto particles being pneumatically transported in a tube. The process comprising the steps of providing a tube having an inlet opening and an outlet opening; feeding a carrier gas entraining particles into the tube at or near the inlet opening of the tube to create a particle flow through the tube; and injecting a first self-terminating reactant into the tube via at least one injection point downstream from the inlet opening of the tube for reaction with the particles in the particle flow. The process is suitable for atomic layer deposition and molecular layer deposition. An apparatus for carrying out the process is also disclosed.

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