Process gas distribution system and method with supervisory control
    5.
    发明授权
    Process gas distribution system and method with supervisory control 失效
    工艺气体分配系统及其监控方法

    公开(公告)号:US5220517A

    公开(公告)日:1993-06-15

    申请号:US576067

    申请日:1990-08-31

    IPC分类号: F17C13/02 F17C13/04 H01L21/00

    摘要: A plurality of gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control unit is connected to a single tool interface controller over a single communications cable. The status and operational characteristics of the individual units are communicated through the tool interface controller to a supervisory control computer by means of polling. Each flow control cabinet has its own data processor, and can be operated alone. Also, the supervisory computer can be used to operate each cabinet, as well as to monitor operations of the system. Gas demand and other signals are communicated from each tool location to the control units through a single cable connected to the interface controller, thus reducing the original wiring cost. Changing the communications path to accompany a change of the tool to which a given conduit in one of the cabinets delivers its gas can be done quickly, in software, with a few keystrokes. Mechanical re-wiring is not needed.

    摘要翻译: 连接机柜中的多个气体流量控制单元,以将处理气体根据需要分配到半导体制造工厂中被称为“工具”位置的多个利用位置。 每个气体流量控制单元通过单个通信电缆连接到单个工具接口控制器。 各个单元的状态和操作特性通过工具界面控制器通过轮询方式传送到监控控制计算机。 每个流量控制柜都有自己的数据处理器,可以单独操作。 此外,监控计算机可用于操作每个机柜,以及监视系统的操作。 气体需求和其他信号通过连接到接口控制器的单个电缆从每个工具位置传送到控制单元,从而降低原始接线成本。 改变通信路径以伴随其中一个机柜中的给定导管传送其气体的工具的改变,可以通过软件快速地进行几次击键。 不需要机械重新布线。

    Zero dead-leg gas control apparatus and method
    6.
    发明授权
    Zero dead-leg gas control apparatus and method 失效
    零死点气体控制装置及方法

    公开(公告)号:US5657786A

    公开(公告)日:1997-08-19

    申请号:US664788

    申请日:1996-06-17

    摘要: A gas cabinet manifold is free of dead-legs both during delivery of process gas to a semiconductor fabrication tool location and during purging of the manifold. The manifold includes three similar dual valve assembly blocks. Each valve assembly block includes two valves and each of the valves has a valve chamber in which are formed three ports. Each valve also includes a mechanism for selectively closing one of its three ports. Each of the valves has one of its non-closeable ports connected via a conduit to a corresponding non-closeable port of the other valve, and the other non-closeable ports are connected by a second conduit which is connected by a third conduit to a port by which gas may be introduced into the valve block. A vacuum venturi or other vacuum source is used to vent process gas from a high pressure area of the manifold by way of a pressure regulator and a low pressure area of the manifold. A valve block similar to those described above, but with manually actuated valves, is used in a purge gas manifold that is installed in association with the gas cabinet manifold.

    摘要翻译: 在将工艺气体输送到半导体制造工具位置和在歧管清洗期间,气柜歧管都没有死角。 歧管包括三个类似的双阀组件块。 每个阀组件块包括两个阀,并且每个阀具有形成三个端口的阀室。 每个阀还包括用于选择性地关闭其三个端口中的一个的机构。 每个阀具有通过管道连接到另一个阀的相应的不可关闭端口的其不可关闭端口中的一个,并且其它不可关闭端口通过第二导管连接,第二导管通过第三导管连接到 气体可以被引入阀块的端口。 真空文丘里管或其他真空源用于通过压力调节器和歧管的低压区域从歧管的高压区域排出处理气体。 类似于上述的阀块,但是具有手动致动的阀,被用在与气柜歧管相关联地安装的吹扫气体歧管中。