公开(公告)号：US20050270445A1

公开(公告)日：2005-12-08

申请号：US11135646

申请日：2005-05-24

申请人： Deok Lee ,  Kwang Oh ,  Myung Nam ,  Ki Cho ,  Se Shin ,  Bong Kim ,  Kwon Choi

发明人： Deok Lee ,  Kwang Oh ,  Myung Nam ,  Ki Cho ,  Se Shin ,  Bong Kim ,  Kwon Choi

IPC分类号： G02F1/136 ,  G02F1/1335 ,  G02F1/1362

CPC分类号： G02F1/133514 ,  G02F1/136227 ,  G02F2001/133565 ,  G02F2001/133567

摘要： A color filter-on-thin film transistor substrate includes gate data lines crossing each other and defining pixel areas, thin film transistors is located at crossings of gate and data lines, pixel electrodes connected to the thin film transistors and formed within the pixel areas, and stripe-shaped color filters overlapping a plurality of pixel areas and oriented parallel to one of the gate and data lines.

摘要翻译： 薄膜上的滤色器晶体管基板包括彼此交叉并且限定像素区域的栅极数据线，薄膜晶体管位于栅极和数据线的交叉处，连接到薄膜晶体管并形成在像素区域内的像素电极， 以及与多个像素区域重叠并且平行于栅极和数据线之一取向的条形滤色器。

公开(公告)号：US20050219433A1

公开(公告)日：2005-10-06

申请号：US11091477

申请日：2005-03-29

申请人： Kwang Oh ,  Myung Nam ,  Ki Cho ,  Se Shin ,  Bong Kim ,  Kwon Choi

发明人： Kwang Oh ,  Myung Nam ,  Ki Cho ,  Se Shin ,  Bong Kim ,  Kwon Choi

IPC分类号： G02F1/136 ,  G02F1/133 ,  G02F1/1362 ,  H01L21/77 ,  H01L21/84 ,  H01L27/12 ,  H01L29/786

CPC分类号： G02F1/13458 ,  G02F1/136227 ,  H01L27/124 ,  H01L27/1288

摘要： An LCD device and a method for manufacturing the same is disclosed in which the manufacturing process is simplified by etching an overcoat layer and a lower insulating layer at the same time. Disclosed is a method for manufacturing the LCD device that includes forming a thin film transistor (TFT) on an active region of a substrate, forming a gate pad region and data pad region, and forming a passivation layer on the entire surface of the substrate. The manufacturing method further includes forming an overcoat layer and selectively etching the overcoat layer. Contact holes for the pixel electrode, the gate pad, and the data pad are formed by selectively etching the overcoat layer, the passivation layer, and the gate insulating layer though one process.

摘要翻译： 公开了一种LCD装置及其制造方法，其中通过同时蚀刻外涂层和下绝缘层来简化制造工艺。 公开了一种用于制造LCD器件的方法，其包括在衬底的有源区上形成薄膜晶体管（TFT），形成栅极焊盘区域和数据焊盘区域，并在衬底的整个表面上形成钝化层。 制造方法还包括形成外涂层并选择性地蚀刻外涂层。 通过一个工艺，通过选择性地蚀刻外涂层，钝化层和栅极绝缘层来形成像素电极，栅极焊盘和数据焊盘的接触孔。