Stabilizer compounds for photothermographic elements
    1.
    发明授权
    Stabilizer compounds for photothermographic elements 失效
    用于光热敏成像元件的稳定剂化合物

    公开(公告)号:US6083681A

    公开(公告)日:2000-07-04

    申请号:US329693

    申请日:1999-06-10

    IPC分类号: G03C1/498 G03C5/08

    CPC分类号: G03C1/49845 G03C1/34

    摘要: Compounds having general structure (I) have been found to be useful as stabilizers in photothermographic elements. The photothermographic elements comprise a support bearing an imaging coating (specifically, a photosensitive, image-forming, photothermographic coating) comprising:(a) a photosensitive silver halide;(b) a non-photosensitive, reducible source of silver;(c) a reducing agent for the non-photosensitive, reducible source of silver;(d) a binder; and(e) a compound having general structure (I) ##STR1## wherein X is O or S; and Y is NH.sub.2, OH, or O.sup.- M.sup.+ wherein M.sup.+ is a metal atom.The photothermographic elements may be used in medical imaging films or as a photomask in a process where there is a subsequent exposure of an ultraviolet or short wavelength visible radiation-sensitive imageable medium.

    摘要翻译: 已经发现具有一般结构(I)的化合物可用作光热敏成像元件中的稳定剂。 光热敏成像元件包括承载成像涂层(具体地,感光,成像,光热敏成像涂层)的载体,包括:(a)光敏卤化银; (b)非光敏,可还原的银源; (c)用于非光敏,可还原的银源的还原剂; (d)粘合剂; 和(e)具有通式(I)的化合物,其中X为O或S; Y是NH 2,OH或O-M +,其中M +是金属原子。 光热敏成像元件可以在随后暴露紫外线或短波长可见光辐射敏感可成像介质的过程中用于医学成像膜或光掩模。

    Sulfonyl hydrazide developers for photothermographic and thermographic
elements
    2.
    发明授权
    Sulfonyl hydrazide developers for photothermographic and thermographic elements 失效
    用于光热照相和热成像元素的磺酰基酰肼显影剂

    公开(公告)号:US5464738A

    公开(公告)日:1995-11-07

    申请号:US369738

    申请日:1995-01-06

    IPC分类号: G03C8/40 B41M5/333 G03C1/498

    摘要: Sulfonyl hydrazides are used as developers in phothothermographic and thermographic elements. The sulfonyl hydrazides have the formula:R.sup.1 --CO--NHNH--SO.sub.2 --R.sup.2wherein R.sup.1 and R.sup.2 may be each independently selected from the group consisting of alkyl and alkenyl groups of up to 20 carbon atoms, preferably alkyl and alkenyl of up to 10 carbon atoms, more preferably alkyl and alkenyl groups of up to 5 carbon atoms; alkoxy groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably of up to 5 carbon atoms; aryl, alkaryl, and aralkyl groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably up to 6 carbon atoms; aryloxy groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably of up to 6 carbon atoms; non-aromatic and aromatic heterocyclic ring groups containing up to 6 ring atoms; alicyclic ring groups containing up to 6 ring carbon atoms; and fused ring and bridging groups comprising up to 14 ring atoms.The photothermographic and thermographic elements the present invention may be used as a photomaks in a process where there is a subsequent exposure of an ultraviolet radiation sensitive imageable medium.

    摘要翻译: 磺酰肼用作光热敏成像和热成像元件中的显影剂。 磺酰肼具有下式:R1-CO-NHNH-SO2-R2,其中R1和R2可以各自独立地选自由至多20个碳原子的烷基和烯基组成的组,优选至多10个碳原子的烷基和链烯基 原子,更优选至多5个碳原子的烷基和链烯基; 优选至多20个碳原子,优选至多10个碳原子,更优选至多5个碳原子的烷氧基; 最多20个碳原子,优选至多10个碳原子,更优选最多6个碳原子的芳基,烷芳基和芳烷基; 最多20个碳原子,优选至多10个碳原子,更优选至多6个碳原子的芳氧基; 含有至多6个环原子的非芳族和芳族杂环基团; 含有多达6个环碳原子的脂环族基团; 以及包含至多14个环原子的稠合环和桥连基团。 本发明的光热敏照相和热成像元件可以在随后暴露紫外线照射敏感成像介质的过程中用作光敏元件。

    Sulfonyl hydrazide developers for photothermographic and thermographic
    3.
    发明授权
    Sulfonyl hydrazide developers for photothermographic and thermographic 失效
    用于光热照相和热成像的磺酰肼显影剂

    公开(公告)号:US5512411A

    公开(公告)日:1996-04-30

    申请号:US517380

    申请日:1995-08-21

    摘要: Sulfonyl hydrazides are used as developers in phothothermographic and thermographic elements. The sulfonyl hydrazides have the formula:R.sup.1 --CO--NHNH--SO.sub.2 --R.sup.2wherein R.sup.1 and R.sup.2 may be each independently selected from the group consisting of alkyl and alkenyl groups of up to 20 carbon atoms, preferably alkyl and alkenyl of up to 10 carbon atoms, more preferably alkyl and alkenyl groups of up to 5 carbon atoms; alkoxy groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably of up to 5 carbon atoms; aryl, alkaryl, and aralkyl groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably up to 6 carbon atoms; aryloxy groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably of up to 6 carbon atoms; non-aromatic and aromatic heterocyclic ring groups containing up to 6 ring atoms; alicyclic ring groups containing up to 6 ring carbon atoms; and fused ring and bridging groups comprising up to 14 ring atoms.The photothermographic and thermographic elements the present invention may be used as a photomaks in a process where there is a subsequent exposure of an ultraviolet radiation sensitive imageable medium.

    摘要翻译: 磺酰肼用作光热敏成像和热成像元件中的显影剂。 磺酰肼具有下式:R1-CO-NHNH-SO2-R2,其中R1和R2可以各自独立地选自由至多20个碳原子的烷基和烯基组成的组,优选至多10个碳原子的烷基和链烯基 原子,更优选至多5个碳原子的烷基和链烯基; 优选至多20个碳原子,优选至多10个碳原子,更优选至多5个碳原子的烷氧基; 最多20个碳原子,优选至多10个碳原子,更优选最多6个碳原子的芳基,烷芳基和芳烷基; 最多20个碳原子,优选至多10个碳原子,更优选至多6个碳原子的芳氧基; 含有至多6个环原子的非芳族和芳族杂环基团; 含有多达6个环碳原子的脂环族基团; 以及包含至多14个环原子的稠合环和桥连基团。 本发明的光热敏照相和热成像元件可以在随后暴露紫外线照射敏感成像介质的过程中用作光敏元件。

    Co-developers for black-and-white photothermographic elements
    7.
    发明授权
    Co-developers for black-and-white photothermographic elements 有权
    黑白光热照相元件的共同开发商

    公开(公告)号:US06387605B1

    公开(公告)日:2002-05-14

    申请号:US09239182

    申请日:1999-01-28

    IPC分类号: G03C1498

    CPC分类号: G03C1/49881 G03C1/49827

    摘要: Novel co-developer compounds are useful in combination with hindered phenol developers to produce high contrast black-and-white photothermographic elements. The co-developer compounds have the formula wherein: Y is H, a metal (preferably, an alkali metal), or an alkyl group (preferably, an alkyl group having from 1 to 4 carbon atoms), and the solid curved line represents the atoms and bonds necessary to complete a ring structure (preferably a 5 or 6 membered ring structure). The photothermographic elements may be used as a photomask in a process where there is a subsequent exposure of an ultraviolet or short wavelength visible radiation-sensitive imageable medium.

    摘要翻译: 新的共显影剂化合物可与受阻酚显影剂组合使用以产生高对比度黑白光热敏成像元件。 共显影剂化合物具有式为:Y为H,金属(优选碱金属)或烷基(优选为具有1至4个碳原子的烷基),实心曲线表示原子 和完成环结构(优选5或6元环结构)所必需的键。光热敏成像元件可以在随后暴露紫外或短波长可见光辐射敏感可成像介质的过程中用作光掩模。