公开(公告)号：US08513457B2

公开(公告)日：2013-08-20

申请号：US13474187

申请日：2012-05-17

申请人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

发明人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

IPC分类号： C07C59/58

CPC分类号： C07C69/653 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108 ,  Y10S430/115 ,  Y10S430/143 ,  Y10S430/167 ,  Y10T428/24802

摘要： A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

摘要翻译： 由式（1）表示的含氟不饱和羧酸，其中R 1表示可聚合双键的基团，R 3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。

公开(公告)号：US07858385B2

公开(公告)日：2010-12-28

申请号：US09859701

申请日：2001-05-16

申请人： Benjamin P. Warner ,  George J. Havrilla ,  Grace Mann

发明人： Benjamin P. Warner ,  George J. Havrilla ,  Grace Mann

IPC分类号： G01N21/76 ,  G01N33/543 ,  G01N33/00

CPC分类号： G01N33/582 ,  G01N33/54373 ,  Y10S430/167 ,  Y10T436/16 ,  Y10T436/18 ,  Y10T436/19

摘要： Method for detecting binding events using micro-X-ray fluorescence spectrometry. Receptors are exposed to at least one potential binder and arrayed on a substrate support. Each member of the array is exposed to X-ray radiation. The magnitude of a detectable X-ray fluorescence signal for at least one element can be used to determine whether a binding event between a binder and a receptor has occurred, and can provide information related to the extent of binding between the binder and receptor.

摘要翻译： 使用微X射线荧光光谱法检测结合事件的方法。 受体暴露于至少一种潜在的粘合剂并排列在基底支架上。 阵列的每个成员暴露于X射线辐射。 可以使用至少一种元素的可检测X射线荧光信号的大小来确定粘合剂和受体之间的结合事件是否已经发生，并且可以提供与粘合剂和受体之间的结合程度相关的信息。

公开(公告)号：US07682780B2

公开(公告)日：2010-03-23

申请号：US12486770

申请日：2009-06-18

申请人： Masayoshi Fujita ,  Yoshihisa Hashi

发明人： Masayoshi Fujita ,  Yoshihisa Hashi

IPC分类号： G03C1/005 ,  G03C1/494 ,  G03C1/00

CPC分类号： G03C5/16 ,  G03C1/0051 ,  G03C1/09 ,  G03C5/17 ,  Y10S430/167

摘要： An industrial X-ray photosensitive material including at least one silver halide emulsion layer on both sides of a transparent support, wherein the silver halide emulsion layer contains tabular silver halide particles having an average particle thickness of less than 0.2 μm and an aspect ratio of more than 8, a core of the particles which is a core having a volume of 1% or more and less than 3% of a particle volume does not contain Ir or Rh, and a shell of the particles which is a shell having a volume of 97% or more and less than 99% of a particle volume contains at least Ir or Rh. An industrial X-ray photosensitive material having rapid processing suitability, as well as high sensitivity and high contrast is provided.

摘要翻译： 一种工业X射线感光材料，其在透明支撑体的两侧包含至少一个卤化银乳剂层，其中所述卤化银乳剂层含有平均粒度小于0.2μm的片状卤化银颗粒和更多的纵横比 比颗粒体积的1％以上且小于3％的核心的核心不含有Ir或Rh，作为壳体的壳体的体积为 97％以上且小于99％的粒子体积至少含有Ir或Rh。 提供了具有快速加工适应性以及高灵敏度和高对比度的工业X射线感光材料。

公开(公告)号：US07485407B2

公开(公告)日：2009-02-03

申请号：US11640172

申请日：2006-12-18

申请人： Hyo-Jin Yun ,  Jae-Ho Kim ,  Young-Ho Kim ,  Boo-Deuk Kim ,  Do-Young Kim

发明人： Hyo-Jin Yun ,  Jae-Ho Kim ,  Young-Ho Kim ,  Boo-Deuk Kim ,  Do-Young Kim

IPC分类号： G03C1/73 ,  G03F7/20 ,  G03F7/30 ,  G03F7/36 ,  C07F7/21

CPC分类号： G03F7/0757 ,  C07F7/21 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0755 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/146 ,  Y10S430/167

摘要： Disclosed are a siloxane compound, a photoresist composition using the same, and a method of forming a pattern, wherein the siloxane compound is having a general formula: wherein R1 is a tertiary butyl group or a 1-(tert-butoxy)ethyl group, and R2 and R3 is each independently a lower alkyl group having 1 to 4 carbon atoms.

摘要翻译： 公开了硅氧烷化合物，使用其的光致抗蚀剂组合物和形成图案的方法，其中硅氧烷化合物具有以下通式：其中R1是叔丁基或1-（叔丁氧基）乙基， 并且R 2和R 3各自独立地为具有1至4个碳原子的低级烷基。

公开(公告)号：US20070026349A1

公开(公告)日：2007-02-01

申请号：US11543023

申请日：2006-10-05

申请人： Takeshi Funakubo

发明人： Takeshi Funakubo

IPC分类号： G03C1/00

CPC分类号： G03C1/498 ,  G03C5/17 ,  Y10S430/167

摘要： The invention provides a photothermographic material having, on both sides of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, which is to be exposed with X-rays using a fluorescent intensifying screen, wherein (1) a coating amount of the photosensitive silver halide per one side is from 0.01 g/m2 to 0.45 g/m2 in terms of silver amount; and (2) a crossover (%) is 30% or more, or when parallel light having the same wavelength as a main emission peak wavelength of the fluorescent intensifying screen is incident perpendicular to the surface of the photothermographic material, the parallel light component of transmitted light comprises 5% or more of the incident light. A photothermographic material for medical use having high sensitivity and high image quality is provided.

摘要翻译： 本发明提供了一种光热敏成像材料，其在载体的两侧上具有至少包含感光卤化银，非光敏有机银盐，还原剂和粘合剂的图像形成层，其将被暴露于X - 使用荧光增强屏幕的方法，其中（1）每一侧的感光卤化银的涂布量为0.01g / m 2至0.45g / m 2 以银量计; 和（2）交叉（％）为30％以上，或者当与荧光增强屏的主发光峰值波长具有相同波长的平行光垂直于光热敏成像材料的表面入射时，平行光成分 透射光包含5％以上的入射光。 提供了具有高灵敏度和高图像质量的用于医疗用途的光热敏成像材料。

公开(公告)号：US20060078833A1

公开(公告)日：2006-04-13

申请号：US11240560

申请日：2005-09-30

申请人： Sharon Simpson ,  Lilia Burleva ,  Kumars Sakizadeh

发明人： Sharon Simpson ,  Lilia Burleva ,  Kumars Sakizadeh

IPC分类号： G03C1/005

CPC分类号： G03C1/49845 ,  G03C1/498 ,  G03C2001/03535 ,  G03C2001/091 ,  Y10S430/167

摘要： Photothermographic materials are designed with increased photospeed by chemical sensitizing the photosensitive silver halide grains with a combination of compounds. A first chemical sensitizer is a specific gold(III)-containing compound and a second chemical sensitizer is a sulfur-containing compound that is a diphenylphosphine sulfide. The molar ratio of the gold (III)-containing compound to the sulfur-containing compound is at least 1:1.

摘要翻译： 光热成像材料通过化学敏化感光卤化银颗粒与化合物的组合而设计成具有更高的感光速度。 第一种化学敏化剂是特定的含金（III）的化合物，第二种化学增感剂是二苯基硫化膦的含硫化合物。 含金（III）的化合物与含硫化合物的摩尔比为至少1:1。

公开(公告)号：US07008749B2

公开(公告)日：2006-03-07

申请号：US09992560

申请日：2001-11-05

申请人： Kenneth E. Gonsalves

发明人： Kenneth E. Gonsalves

IPC分类号： G03C1/73 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F30/08 ,  C08F28/02

CPC分类号： B82Y30/00 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0047 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/075 ,  G03F7/0752 ,  G03F7/0755 ,  G03F7/0757 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/143 ,  Y10S430/167

摘要： The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

公开(公告)号：US07008737B2

公开(公告)日：2006-03-07

申请号：US10804771

申请日：2004-03-19

申请人： Alfredo M. Morales ,  Marcela Gonzales

发明人： Alfredo M. Morales ,  Marcela Gonzales

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F1/22 ,  B29C33/38 ,  B29C33/424 ,  G03F1/50 ,  G03F7/0017 ,  G03F7/203 ,  Y10S430/167 ,  Y10T428/12361 ,  Y10T428/12486 ,  Y10T428/12708 ,  Y10T428/12743 ,  Y10T428/12778

摘要： The present invention describes a method for fabricating an embossing tool or an x-ray mask tool, providing microstructures that smoothly vary in height from point-to-point in etched substrates, i.e., structure which can vary in all three dimensions. The process uses a lithographic technique to transfer an image pattern in the surface of a silicon wafer by exposing and developing the resist and then etching the silicon substrate. Importantly, the photoresist is variably exposed so that when developed some of the resist layer remains. The remaining undeveloped resist acts as an etchant barrier to the reactive plasma used to etch the silicon substrate and therefore provides the ability etch structures of variable depths.

摘要翻译： 本发明描述了一种用于制造压花工具或x射线掩模工具的方法，提供在蚀刻的基底中从点到点平滑地高度变化的微结构，即可在所有三维中变化的结构。 该方法使用光刻技术通过曝光和显影抗蚀剂然后蚀刻硅衬底来转移硅晶片表面中的图像图案。 重要的是，光致抗蚀剂可变地暴露，使得当显影时，保留了一些抗蚀剂层。 剩余的未显影的抗蚀剂作为用于蚀刻硅衬底的反应性等离子体的蚀刻剂屏障，因此提供可变深度的蚀刻结构。

公开(公告)号：US20060035178A1

公开(公告)日：2006-02-16

申请号：US11196451

申请日：2005-08-04

申请人： Takayoshi Mori

发明人： Takayoshi Mori

IPC分类号： G03C1/00

CPC分类号： G03C1/49818 ,  G03C1/498 ,  G03C1/49881 ,  G03C5/17 ,  G03C2001/0055 ,  G03C2001/03517 ,  G03C2001/03535 ,  G03C2001/03552 ,  G03C2001/7425 ,  Y10S430/167 ,  Y10S430/168

摘要： A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and an X-ray image forming method using the same, wherein 50% or more of a total projected area of the photosensitive silver halide is occupied by tabular grains having an aspect ratio of 2 or more, and the grains have at least one epitaxial junction portion having a multifold structure. A photothermographic material with high sensitivity and excellent storage stability, and an image forming method using the material are provided.

摘要翻译： 一种光热敏成像材料，在支撑体的至少一侧具有至少含有感光卤化银，非感光性有机银盐，还原剂和粘合剂的图像形成层，以及X射线图像形成方法 使用它们，其中感光卤化银的总投影面积的50％以上占据具有2倍以上的纵横比的片状颗粒，并且该晶粒具有至少一个具有多层结构的外延接合部分。 提供了具有高灵敏度和优异储存稳定性的光热敏成像材料，以及使用该材料的成像方法。

公开(公告)号：US06936411B2

公开(公告)日：2005-08-30

申请号：US10758577

申请日：2004-01-15

申请人： Marc Van de Zegel ,  Marleen De Vester

发明人： Marc Van de Zegel ,  Marleen De Vester

IPC分类号： G03C1/04 ,  G03C1/053 ,  G03C1/46 ,  G03C5/16 ,  G03C5/26 ,  G03C1/047 ,  G03C1/30

CPC分类号： G03C5/16 ,  G03C1/04 ,  G03C1/053 ,  G03C1/30 ,  G03C1/46 ,  G03C5/26 ,  G03C2001/03594 ,  G03C2005/168 ,  G03C2007/3025 ,  G03C2200/27 ,  G03C2200/52 ,  Y10S430/167 ,  Y10S430/168

摘要： A silver halide industrial radiographic material comprising on at least one side of a support a hydrophilic gelatinous non-spectrally sensitized radiation-sensitive emulsion layer, having grains, coated in a total amount in the range from 6 to 20 g, expressed as an equivalent amount of silver nitrate per square meter, and at least one non-radiation sensitive protective gelatinous antistress overcoat layer thereupon, wherein a ratio of gelatin to silver, expressed as silver nitrate in the said layer arrangement is at least 0.70, wherein said gelatinous layers are hardened by a gelatin cross-linking agent in an amount in order to have a dissolving time of at least 40 minutes, said time being defined as the period of time from the moment when the silver halide photographic material, dipped into 50 ml of an aqueous solution of 1.5% by weight of sodium hydroxide at 50° C., until the moment that the base becomes visible due to dissolving of the layers coated thereupon, is characterized by a hydrophilic gelatinous layer arrangement wherein a hydrophilic polymer is present in an amount of at least 1 g per m2.

摘要翻译： 一种卤化银工业射线照相材料，其在载体的至少一侧上包含亲水性凝胶状非光谱敏化型辐射敏感乳剂层，其具有以6至20g的总量涂覆的颗粒，其表示为当量 每平方米的硝酸银和至少一种非辐射敏感性的防静电胶质抗静电外涂层，其中所述层布置中以硝酸银表示的明胶与银的比例至少为0.70，其中所述凝胶状层被硬化 通过明胶交联剂以使溶解时间至少为40分钟，所述时间定义为从卤化银照相材料浸入50ml水溶液中的时间 在50℃下为1.5重量％的氢氧化钠，直到由于其上涂覆的层的溶解使基体变得可见的时刻，其特征在于 亲水凝胶层布置，其中亲水性聚合物以每平方米至少1克的量存在。