公开(公告)号：US4744833A

公开(公告)日：1988-05-17

申请号：US61753

申请日：1987-06-11

申请人： Douglas W. Cooper ,  Henry L. Wolfe ,  James T. C. Yeh

发明人： Douglas W. Cooper ,  Henry L. Wolfe ,  James T. C. Yeh

IPC分类号： H05F3/04 ,  B08B6/00 ,  G11B5/84 ,  G11B23/50 ,  H01L21/00 ,  H01L21/304 ,  B08B3/12

CPC分类号： H01L21/67028 ,  B08B6/00 ,  G11B23/50 ,  G11B5/84

摘要： An apparatus and method for electrostatic removal of micron and sub-micron sized contaminant particles is disclosed herein. The apparatus and method comprise creating a potential difference with a megavolt/cm electrostatic field between two conducting bases in a predetermined geometrical relation to each other. An insulator (e.g. a dielectric film) is maintained at or near contact between one of the bases and the surface to be cleaned to electrostatically remove particles from said surface. The bases can be made to move relative to each other and the surface to be cleaned.

公开(公告)号：US5062898A

公开(公告)日：1991-11-05

申请号：US534810

申请日：1990-06-05

申请人： Wayne T. McDermott ,  Richard C. Ockovic ,  Jin J. Wu ,  Douglas W. Cooper ,  Alexander Schwarz ,  Henry L. Wolfe

发明人： Wayne T. McDermott ,  Richard C. Ockovic ,  Jin J. Wu ,  Douglas W. Cooper ,  Alexander Schwarz ,  Henry L. Wolfe

IPC分类号： H01L21/304 ,  B08B3/12 ,  B08B7/00 ,  B24C1/00 ,  B24C3/32 ,  H01L21/00

CPC分类号： B24C1/086 ,  B08B3/12 ,  B08B7/0021 ,  B08B7/0092 ,  B24C1/003 ,  B24C3/322 ,  H01L21/67028

摘要： A method is disclosed for cleaning microelectronics surfaces using an aerosol of at least substantially solid argon particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.

公开(公告)号：US5294261A

公开(公告)日：1994-03-15

申请号：US970346

申请日：1992-11-02

申请人： Wayne T. McDermott ,  Richard C. Ockovic ,  Jin J. Wu ,  Douglas W. Cooper ,  Alexander Schwarz ,  Henry L. Wolfe

发明人： Wayne T. McDermott ,  Richard C. Ockovic ,  Jin J. Wu ,  Douglas W. Cooper ,  Alexander Schwarz ,  Henry L. Wolfe

IPC分类号： H01L21/304 ,  B08B3/12 ,  B08B7/00 ,  B08B7/02 ,  B24C1/00 ,  B24C3/32 ,  H01L21/00 ,  B08B5/00

CPC分类号： H01L21/67028 ,  B08B3/12 ,  B08B7/0021 ,  B08B7/0092 ,  B08B7/028 ,  B24C1/003 ,  B24C3/322

摘要： A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon or nitrogen particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning method.

摘要翻译： 公开了一种使用至少基本上固体的氩或氮颗粒的气溶胶清洁微电子表面的方法，该气溶胶撞击待清洁的表面，然后蒸发，并且通过与通过清洁方法移出的污染物排放一起排出所得气体。