COSMETIC COMPOSITIONS
    1.
    发明申请

    公开(公告)号:US20200237639A1

    公开(公告)日:2020-07-30

    申请号:US16624152

    申请日:2018-06-15

    摘要: This invention relates to a cosmetic composition comprising: (A) a film forming composition that can produce a tack free surface comprising: (I) a hydrosilylation reaction product of: (a) a silicone resin having the formula: (R1R22SiO1/2)w(R1R3SiO2/2)x(R1R2SiO3/2)y(SiO4/2)z wherein R2 is a C1 to C10 hydrocarbon group free of aliphatic unsaturation, R1 is R2 or an alkenyl group, w is from 0.3 to 0.6, x is from 0.0 to 0.2, y is 0, z is from 0.4 to 0.7, w+x+y+z=1.0, and w+z is from 0.85 to 1.0, with the proviso that the silicone resin (a) has at least two silicon-bonded alkenyl groups per number average molecule; (b) a polyether compound having the formula: R3O(C2H4O)c(C3H6O)dR3 wherein R3 is a monovalent unsaturated aliphatic hydrocarbon M group containing 2 to 12 carbon atoms, c is from 0 to 50, d is from 0 to 50, and the value of c+d is greater than zero; (c) an SiH functional organopolysiloxane having the general formula: HcR3-cSiO(R2SiO)a(RHSiO)bSiR3-cHc wherein c is 0 or 1, R can be identical or different and is a monovalent, optionally substituted hydrocarbon group with 1 to 18 carbon atoms per molecule, a and b are integers, with the proviso that the sum of a+b is 0 to 300, and wherein the organopolysiloxane contains SiH in amounts from 0.01 to 0.4 wt %; (d) a hydrosilylation catalyst; and (e) carrier solvent; and (II) a silicone resin having the formula: (R43SiO1/2)u(SiO4/2)v wherein R4 is a C1 to C10 to do hydrocarbon group free of aliphatic unsaturation, u is from 0.3 to 0.6, v is from 0.4 to 0.7, and the value of u+v is 1.0; and (B) at least one cosmetic ingredient.

    LOW ISOMER HYDROSILYLATION
    2.
    发明申请

    公开(公告)号:US20220363837A1

    公开(公告)日:2022-11-17

    申请号:US17761367

    申请日:2020-12-01

    摘要: A reaction composition contains (a) an allyl polyether having the following formula: CH2=CHCH2O-Aa-B where, (i) subscript a is 2 to 170; (ii) A is selected from: —CH2CH2O—; —CH2CH(CH3)O—; —CH(CH3)CH2O—, CH2CH(CH2CH3)O—; —CH(CH2CH3)CH2O, —CH2CF(CF3)O—, —CF(CF3)CF2O— and —CF2CF(CF3)O—; and (iii) B is selected from —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH2CH2CH2CH3, —C(O)CH3, and —CF2CF2CF3; (b) A silyl hydride functional siloxanc comprising the following siloxane units [R2HSiO1/2]m[R2SiO2/2]d[R2SiO3/2]t[SiO4/2]q wherein d+t+q is one or more and wherein: (i) R is selected from hydrocarbyl groups liaing from one to 8 carbon atoms; (ii) subscript m is 2 or more; (iii) subscript d is zero to 20; (iv) subscript t is zero to 2; (v) subscript q is zero to 2; and (c) a platinum-based hydrosilylation catalyst; where there are at least 4 molar equivalents of silyl hydride functionalities relative to allyl functionalities in the reaction composition.

    FILM FORMING COMPOSITIONS HAVING A TACK-FREE SURFACE

    公开(公告)号:US20200222302A1

    公开(公告)日:2020-07-16

    申请号:US16624160

    申请日:2018-06-15

    IPC分类号: A61K8/894 C09D183/06 A61Q1/00

    摘要: This invention relates to a film forming composition that can produce a tack free surface comprising: (I) a hydrosilylation reaction product of: (a) a silicone resin having the formula: (R1R22SiO1/2)w(R1R2SiO2/2)x(R2SiO3/2)y(SiO4/2)z wherein R2 is C1 to C10 hydrocarbon group free of aliphatic unsaturation, R1 is R2 or an alkenyl group, w is from 0.3 to 0.6, x is from 0.0 to 0.2, y is 0, z is from 0.4 to 0.7, w+x+y+z=1.0, and w+z is from 0.85 to 1.0, with the proviso that the silicone resin (a) has at least two silicon-bonded alkenyl groups per number average molecule; (b) a polyether compound having the formula: R3O(C2H4))c(C3H6O)dR3 wherein R3 is a monovalent unsaturated aliphatic hydrocarbon group containing 2 to 12 carbon atoms, c is from 0 to 50, d is from 0 to 50, and the value of c+d is greater than zero; (c) an SiH functional organopolysiloxane having the general formula: HcR3-cSiO(R2SiO)a(RHSiO)bSiR3-cHc wherein c is 0 or 1, R can be identical or different and is a monovalent, optionally substituted hydrocarbon group with 1 to 18 carbon atoms per molecule, a and b are integers, with the proviso that the sum of a+b is 0 to 300, and wherein the organopolysiloxane contains SiH in amounts from 0.01 to 0.4 wt %; (d) a hydrosilylation catalyst; and (e) a carrier solvent; and (II) a silicone resin having the formula: (R43SiO1/2)u(SiO4/2)v wherein R4 is a C1 to C10 hydrocarbon group free of aliphatic unsaturation, u is from 0.3 to 0.6, v is from 0.4 to 0.7, and the value of u+v is 1.0. The film forming composition of this invention are useful in manufacturing personal care compositions, which may also be described as a personal care product composition.