公开(公告)号：US06999152B2

公开(公告)日：2006-02-14

申请号：US09788587

申请日：2001-02-21

申请人： Dug jin Park ,  Hai Sung Park ,  Byung Chul Ahn

发明人： Dug jin Park ,  Hai Sung Park ,  Byung Chul Ahn

IPC分类号： G02F1/13 ,  G02F1/1343 ,  G02F1/136

CPC分类号： G02F1/136227 ,  G02F1/134336 ,  G02F2201/123

摘要： A method of fabricating a liquid crystal display using a negative photo-resist. A passivation layer covering a thin film transistor, a data line, and a gate line is formed on a transparent substrate. The passivation layer is patterned to define a contact hole that exposes a drain electrode. A transparent conductive film in electrical contact with the drain electrode via the contact hole is then formed on the passivation layer. A negative-type photoresist is coated on the transparent conductive film. The transparent conductive film is then exposed with an image of the desired pixel electrode. The negative-type photoresist is then developed to expose portions of the transparent conductive film over a data line, a gate line, and the area of the thin film transistor area. The exposed transparent conductive film is then etched.

摘要翻译： 使用负光致抗蚀剂制造液晶显示器的方法。 在透明基板上形成覆盖薄膜晶体管，数据线和栅极线的钝化层。 图案化钝化层以限定暴露漏电极的接触孔。 然后在钝化层上形成与漏电极经由接触孔电接触的透明导电膜。 在透明导电膜上涂布负型光致抗蚀剂。 然后用所需像素电极的图像曝光透明导电膜。 然后显影负型光致抗蚀剂，以在透明导电膜的一部分透过数据线，栅极线和薄膜晶体管区域的面积曝光。 然后将暴露的透明导电膜蚀刻。