公开(公告)号：US20240254391A1

公开(公告)日：2024-08-01

申请号：US18430567

申请日：2024-02-01

Applicant: ENTEGRIS, INC.

Inventor： Hunter Patrick Hickox ,  Atanu K. Das ,  Chia-Jung Hsu ,  Steven A. Lippy

IPC: C09K13/06 ,  C23F1/26

CPC classification number: C09K13/06 ,  C23F1/26

Abstract: Wet etch compositions and related methods are provided herein. A wet etch composition for molybdenum, may include phosphoric acid, acetic acid, nitric acid, and an additive for reducing an oxidation rate of a MoOx layer. The additive may be present in an amount of 0.01% to 5% by weight based on a total weight of the wet etch composition.