CHIP ENCAPSULATION STRUCTURE AND ENCAPSULATION METHOD

    公开(公告)号:US20220230931A1

    公开(公告)日:2022-07-21

    申请号:US17614434

    申请日:2019-05-28

    摘要: A chip encapsulation structure, including: a wafer provided with a groove; a first metal wire arranged on surfaces of the groove and the wafer; a metal solder ball arranged on the first metal wire or on a metal pad of the chip, and is configured to solder the metal pad of the chip to the first metal wire; a first plastic encapsulation film covering upper surfaces of the wafer, the chip and the first metal wire, and entering a gap between a periphery of a functional area of the chip and the first metal wire, so as to form a closed cavity among the wafer, the groove and the chip; an inductive structure arranged on an upper surface of the first plastic encapsulation film and/or a lower surface of the wafer, and connected to the chip through the first metal wire; and a pad arranged on the inductive structure.

    RADIO FREQUENCY FILTER
    2.
    发明申请

    公开(公告)号:US20230039933A1

    公开(公告)日:2023-02-09

    申请号:US17790382

    申请日:2020-01-20

    IPC分类号: H03H9/54 H03H9/13 H03H9/17

    摘要: The present disclosure provides a radio frequency filter, including: a substrate; a supporting electrode protruded on a front surface of the substrate; and a thin film structure formed on the substrate and spaced with the substrate by the supporting electrode. An end surface of a top end of the supporting electrode is in sealing contact with a front surface of the thin film structure.

    SOLIDLY MOUNTED RESONATOR AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230124437A1

    公开(公告)日:2023-04-20

    申请号:US17906392

    申请日:2020-03-18

    IPC分类号: H03H3/04 H03H9/17

    摘要: Provided are a solidly mounted resonator and a method for preparing a solidly mounted resonator. The solidly mounted resonator includes: a piezoelectric structure, wherein the piezoelectric structure includes: an upper electrode layer, a lower electrode layer and a piezoelectric layer. The lower electrode layer disposed corresponding to the piezoelectric structure, and the lower electrode layer includes: a protruding portion protruding downward corresponding to a lower surface of the lower electrode layer; the piezoelectric layer is disposed on an upper surface of the lower electrode layer; the upper electrode layer is disposed on an upper surface of the piezoelectric layer.

    ACOUSTIC WAVE DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220407494A1

    公开(公告)日:2022-12-22

    申请号:US17779251

    申请日:2019-11-25

    摘要: An acoustic wave device including: a POI structure including: a material layer where a high acoustic velocity layer and a low acoustic velocity layer are alternate, a substrate is a lowermost high acoustic velocity layer; a first piezoelectric layer located above the material layer, wherein a layer adjacent to the first piezoelectric layer is referred to as a surface low acoustic velocity layer; wherein an acoustic velocity of a bulk wave propagated in the high acoustic velocity layer and the low high acoustic velocity layer is higher than and lower than an acoustic velocity of a bulk wave of the first piezoelectric layer, respectively. The POI structure includes at least two regions, a first device having a resonance of a first vibration mode is manufactured in the first region, and a second device having a resonance of a second vibration mode is manufactured in a second region.

    BULK ACOUSTIC WAVE FILTER AND METHOD OF MANUFACTURING BULK ACOUSTIC WAVE FILTER

    公开(公告)号:US20220376672A1

    公开(公告)日:2022-11-24

    申请号:US17621367

    申请日:2019-07-10

    摘要: A method of manufacturing a bulk acoustic wave filter is provided, including: forming an acoustic reflection air cavity, a sacrificial layer, a seed layer, a lower electrode layer and a piezoelectric layer of n resonators on a substrate in sequence, wherein n is greater than or equal to 2; taking N from 1 to n for respectively repeating following steps: forming an N-th metal hard mask layer, defining an effective area of a first resonator to an N-th resonator by using a photolithography process, removing the N-th metal hard mask layer outside the effective area of the first resonator to the N-th resonator, oxidizing the piezoelectric layer outside the effective area of the first resonator to the N-th resonator to form an N-th oxidized part of the piezoelectric layer, and etching the N-th oxidized part of the piezoelectric layer; removing the metal hard mask layer of the effective area of the first resonator to the N-th resonator, so as to form the piezoelectric layer having different thicknesses of the first resonator to the N-th resonator; and forming an upper electrode layer on the piezoelectric layer having different thicknesses of the first resonator to the N-th resonator.