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公开(公告)号：US20160195331A1
公开(公告)日：2016-07-07
申请号：US14915709
申请日：2014-10-17
发明人： Jun-Jin HYON , Byoung-Gyu SONG , Kyong-Hun KIM , Yong-Ki KIM , Yang-Sik SHIN , Chang-Dol KIM
CPC分类号： H01L21/67109 , F27B1/02 , F27B1/10 , F27B1/20 , F27B1/21 , F27B3/02 , F27B5/04 , F27B5/06 , F27B5/14 , F27B5/16 , F27B5/18 , F27B17/0033 , F27D3/0084 , H01L21/67126 , H01L21/67757 , H01L21/67778 , H01L21/67781
摘要： Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having a passage, through which substrates are transferred, in one side thereof, the chamber body having opened upper and lower portions, an inner reaction tube disposed above the chamber body to provide a process space in which a process with respect to the substrates is performed, the inner reaction tube having an opened lower portion, a substrate holder disposed in the opened lower portion of the chamber to move between a stacking position at which the substrates transferred through the passage are vertically stacked and a process position at which the substrate holder ascends toward the process space to perform the process with respect to the stacked substrates, a blocking plate connected to a lower portion of the substrate holder to ascend or descend together with the substrate holder, the blocking plate closing the opened lower portion of the inner reaction tube at the process position, a connection cylinder vertically disposed on a lower portion of the blocking plate to ascend or descend together with the blocking plate, and a blocking member connected between the opened lower portion of the chamber body and the connection cylinder to isolate the opened lower portion of the chamber body from the outside.
摘要翻译： 提供了一种基板处理装置。 基板处理装置包括：室主体，其一侧具有通过基板传送的通道，具有敞开的上部和下部的室主体，设置在室主体上方的内部反应管，以提供处理空间，其中， 执行相对于基板的处理，内反应管具有开口的下部，基板保持器设置在室的开口下部，以在堆叠位置之间移动，在该堆叠位置处，通过该通道传送的基板垂直堆叠， 处理位置，在该处理位置，衬底保持器朝向处理空间上升以执行相对于堆叠的衬底的处理，阻挡板连接到衬底保持器的下部以与衬底保持器一起上升或下降，阻挡板关闭 在处理位置打开内部反应管的下部，连接圆筒垂直向下 在阻挡板的下部突出并与阻挡板一起上升或下降;以及阻挡构件，其连接在室主体的敞开的下部与连接筒之间，以将室主体的打开的下部与外部隔开 。
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公开(公告)号：US20150337460A1
公开(公告)日：2015-11-26
申请号：US14652986
申请日：2014-01-09
发明人： Il-Kwang YANG , Byoung-Gyu SONG , Kyong-Hun KIM , Yong-Ki KIM , Yang-Sik SHIN
IPC分类号： C30B35/00
CPC分类号： C30B35/005 , H01L21/67109 , H01L21/67757
摘要： Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber in which a process with respect to a substrate is performed, a preliminary chamber connected to the process chamber, the preliminary chamber having a passage through which the substrate is accessed, a blocking plate partitioning the inside of the preliminary chamber into a holding region and a transfer region, a substrate holder on which at least one substrate is loaded, the substrate holder being switchable into a loading position in which the substrate holder is disposed on the holding region and a process position in which the substrate holder is disposed on the process chamber, a substrate transfer unit transferring the substrate holder from the loading position to the process position, the substrate transfer unit including a transfer arm connected to the substrate holder and a driver operating the transfer arm, a gas supply port supplying an inert gas into the preliminary chamber, and a lower exhaust port connected to the transfer region and disposed above the gas supply port to exhaust the inside of the preliminary chamber. The lower exhaust port is disposed closer to a bottom surface of the preliminary chamber than a top surface of the preliminary chamber.
摘要翻译： 提供了一种基板处理装置。 基板处理装置包括处理室，在该处理室中进行相对于基板的处理，与处理室连接的预备室，预备室具有通过基板被通过的通道，分隔内部的阻挡板 初步室进入保持区域和转移区域，其上装载有至少一个基板的基板保持器，所述基板保持器可切换到其中基板保持器设置在保持区域上的装载位置和处理位置， 衬底保持器设置在处理室上，衬底传送单元将衬底保持器从装载位置传送到处理位置，衬底传送单元包括连接到衬底保持器的传送臂和操作传送臂的驱动器，气体供应 向预备室供应惰性气体的端口，以及连接到t的下排气口 他转移区域并且设置在气体供应口上方以排出预备室的内部。 下排气口比预备室的上表面更靠近预备室的底面设置。
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公开(公告)号：US20150369539A1
公开(公告)日：2015-12-24
申请号：US14766289
申请日：2014-02-17
发明人： Il-Kwang YANG , Byoung-Gyu SONG , kyong-Hun KIM , Yong-Ki KIM , Yang-Sik SHIN
CPC分类号： F27B1/24 , F27B1/08 , F27B17/0025 , H01L21/67109 , H01L21/67757
摘要： Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber having an inner space in which a substrate transferred from the outside is accommodated, and a process with respect to the substrate is performed and a tube type heater disposed around the inner space in a sidewall of the process chamber, the tube type heater having a passage through which a refrigerant supplied from the outside flows.
摘要翻译： 提供了一种基板处理装置。 基板处理装置包括处理室，其具有容纳从外部转移的基板的内部空间，并且执行相对于基板的处理，以及设置在处理室的侧壁中的内部空间周围的管状加热器 管式加热器具有从外部供给的制冷剂通过的通路。
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公开(公告)号：US20170372929A1
公开(公告)日：2017-12-28
申请号：US15535380
申请日：2016-02-19
发明人： Jun-Jin HYON , Joo-Hyun CHO , Chul-Goo KANG , Yong-Ki KIM , Jung-Ki MIN
CPC分类号： H01L21/67253 , G05D7/0652 , G05D7/0664 , H01L21/02 , H01L21/67017
摘要： Provided is a method for multi-supplying gas, the method comprising: installing a control valve and an flow meter on each of a plurality of branch lines branched from a main supply line, in which one or more gases are supplied, and supplying the gas; and providing the gas by adjusting flow of the gas by a controller connected to each of the control valve and the flow meter, wherein the controller has a first control manner, which controls each of the control valves based on a rate of flow measured by the flow meter to required portion flow for each branch line, and the first control manner adjusts an open rate of the control valve if the rate of the measured flow to the required portion flow is not within a predetermined range, and a unit of adjusting the control valve increases or decreases according to a difference between the measured flow and the required portion flow.
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公开(公告)号：US20150380284A1
公开(公告)日：2015-12-31
申请号：US14766150
申请日：2014-02-17
发明人： Il-Kwang YANG , Byoung-Gyu SONG , Kyong-Hun KIM , Yong-Ki KIM , Yang-Sik SHIN
IPC分类号： H01L21/67
CPC分类号： H01L21/67098 , H01L21/67109 , H01L21/67757
摘要： Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber having an inner space in which a substrate transferred from the outside is accommodated, and a process with respect to the substrate is performed, hot-wire heaters disposed in a sidewall of the process chamber, the hot-wire heaters being disposed around the inner space to heat the substrate, and a cooling tube in which a refrigerant supplied from the outside flows, the cooling tube being disposed between the hot-wire heaters along the sidewall of the process chamber.
摘要翻译： 提供了一种基板处理装置。 基板处理装置包括处理室，其具有容纳从外部转移的基板的内部空间，并且执行相对于基板的处理，设置在处理室的侧壁中的热丝加热器， 线材加热器设置在内部空间周围以加热基板，并且冷却管，其中从外部供应的制冷剂流动，冷却管沿着处理室的侧壁设置在热丝加热器之间。
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