公开(公告)号：US12297130B2

公开(公告)日：2025-05-13

申请号：US18216104

申请日：2023-06-29

Applicant: EVOQUA WATER TECHNOLOGIES LLC

Inventor： Boris Eliosov ,  Bruce Lee Coulter ,  Glen P. Sundstrom

IPC: B01D61/18 ,  B01D61/22 ,  B01D63/02 ,  C02F1/44 ,  C02F103/04

Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.

公开(公告)号：US20210403358A1

公开(公告)日：2021-12-30

申请号：US17290246

申请日：2019-10-29

Applicant: Evoqua Water Technologies LLC

Inventor： Glen P. Sundstrom

IPC: C02F9/00 ,  B01D19/00

Abstract: A method including directing an aqueous solution having dissolved carbon dioxide and dissolved ozone into a vessel, removing an amount of the dissolved carbon dioxide and irradiating the effluent with ultraviolet light to decompose an amount of the dissolved ozone is disclosed. The method may include removing the dissolved carbon dioxide by controlling pH. The method may include removing the dissolved carbon dioxide by contact with a membrane degasifier. A system including a channel fluidly connectable to a source of an aqueous solution having dissolved carbon dioxide and dissolved ozone, a dissolved carbon dioxide removal subsystem, and a source of ultraviolet irradiation is also disclosed. The dissolved carbon dioxide removal subsystem may include a source of a pH adjuster. The dissolved carbon dioxide removal subsystem may include a membrane degasifier.

公开(公告)号：US11072545B2

公开(公告)日：2021-07-27

申请号：US16333280

申请日：2017-09-15

Applicant: EVOQUA WATER TECHNOLOGIES LLC

Inventor： Boris Eliosov ,  Glen P. Sundstrom ,  Bruce L. Coulter

IPC: C02F1/44 ,  B01D61/18 ,  B01D61/22 ,  B01D63/02 ,  C02F103/04

Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.

公开(公告)号：US20210181167A1

公开(公告)日：2021-06-17

申请号：US17268450

申请日：2019-08-13

Applicant: Evoqua Water Technologies LLC

Inventor： Glen P. Sundstrom

IPC: G01N31/10 ,  C02F1/00 ,  C02F1/44 ,  C02F1/20 ,  C02F1/42 ,  G01N33/18

Abstract: A method of determining composition of an aqueous solution is disclosed. The method includes obtaining the aqueous solution, removing oxygen from the aqueous solution, determining concentration of dissolved oxygen, removing hydrogen peroxide from the aqueous solution, and determining concentration of dissolved oxygen. The method includes calculating the difference between the concentrations of dissolved oxygen to determine concentration of hydrogen peroxide. A system for determining composition of an aqueous solution is also disclosed. The system includes a feed line connectable to a source of the aqueous solution, an oxygen removal unit, a hydrogen peroxide removal unit, and dissolved oxygen analyzers.

公开(公告)号：US11926550B2

公开(公告)日：2024-03-12

申请号：US17290246

申请日：2019-10-29

Applicant: Evoqua Water Technologies LLC

Inventor： Glen P. Sundstrom

IPC: B01D53/02 ,  B01D19/00 ,  C02F9/00 ,  C02F1/20 ,  C02F1/32 ,  C02F1/66 ,  C02F101/10 ,  C02F103/34

CPC classification number: C02F9/00 ,  B01D19/0031 ,  B01D19/0063 ,  B01D19/0073 ,  C02F1/20 ,  C02F1/32 ,  C02F1/66 ,  C02F2101/10 ,  C02F2103/346 ,  C02F2209/06 ,  C02F2209/23 ,  C02F2209/24 ,  C02F2209/40

Abstract: A method including directing an aqueous solution having dissolved carbon dioxide and dissolved ozone into a vessel, removing an amount of the dissolved carbon dioxide and irradiating the effluent with ultraviolet light to decompose an amount of the dissolved ozone is disclosed. The method may include removing the dissolved carbon dioxide by controlling pH. The method may include removing the dissolved carbon dioxide by contact with a membrane degasifier. A system including a channel fluidly connectable to a source of an aqueous solution having dissolved carbon dioxide and dissolved ozone, a dissolved carbon dioxide removal subsystem, and a source of ultraviolet irradiation is also disclosed. The dissolved carbon dioxide removal subsystem may include a source of a pH adjuster. The dissolved carbon dioxide removal subsystem may include a membrane degasifier.

公开(公告)号：US20230357056A1

公开(公告)日：2023-11-09

申请号：US18216104

申请日：2023-06-29

Applicant: Evoqua Water Technologies LLC

Inventor： Boris Eliosov ,  Bruce Lee Coulter ,  Glen P. Sundstrom

IPC: C02F1/44 ,  B01D61/18 ,  B01D61/22

CPC classification number: C02F1/444 ,  B01D61/18 ,  B01D61/22 ,  B01D63/02

Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.

公开(公告)号：US11702351B2

公开(公告)日：2023-07-18

申请号：US17353735

申请日：2021-06-21

Applicant: Evoqua Water Technologies LLC

Inventor： Boris Eliosov ,  Glen P. Sundstrom ,  Bruce L. Coulter

IPC: C02F1/44 ,  B01D61/18 ,  B01D61/22 ,  B01D63/02 ,  C02F103/04

CPC classification number: C02F1/444 ,  B01D61/18 ,  B01D61/22 ,  B01D63/02 ,  B01D2311/25 ,  B01D2313/50 ,  C02F2103/04 ,  C02F2209/03 ,  C02F2301/046

Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.

公开(公告)号：US20210323843A1

公开(公告)日：2021-10-21

申请号：US17353735

申请日：2021-06-21

Applicant: Evoqua Water Technologies LLC

Inventor： Boris Eliosov ,  Glen P. Sundstrom ,  Bruce L. Coulter

IPC: C02F1/44 ,  B01D61/18 ,  B01D61/22

Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.

公开(公告)号：US20190241446A1

公开(公告)日：2019-08-08

申请号：US16333280

申请日：2017-09-15

Applicant: Evoqua Water Technologies LLC

Inventor： Boris Eliosov ,  Glen P. Sundstrom ,  Bruce L. Coulter

IPC: C02F1/44 ,  B01D61/22 ,  B01D61/18

CPC classification number: C02F1/444 ,  B01D61/18 ,  B01D61/22 ,  B01D63/02 ,  B01D2311/25 ,  B01D2313/50 ,  C02F2103/04 ,  C02F2209/03 ,  C02F2301/046

Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.