Gas stream treatment process
    1.
    发明授权

    公开(公告)号:US10173225B2

    公开(公告)日:2019-01-08

    申请号:US15627167

    申请日:2017-06-19

    申请人: Ecolab USA Inc.

    摘要: A process of treating a gas stream containing at least one mercury compound or species, the process comprising: applying a composition into said gas stream ahead of a particulate matter collection device, wherein said composition contains a compound having the following formula (SiO2)x(OH)yMzSaF, wherein (i) SiO2 is an optional component; (ii) M comprises at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; (iii) S comprises a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; (iii) F is an optional component and if present comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; (iv) the molar ratio of y/x is equal to about 0.01 to about 0.5 and the molar ratio of x/z is equal to about 0.1 to about 300 if SiO2 is present, and if SiO2 is absent X is 0 and Z is 1; and (v) the molar ratio of a/z is about 0.5 to about 5.

    GAS STREAM TREATMENT PROCESS
    3.
    发明申请

    公开(公告)号:US20170341086A1

    公开(公告)日:2017-11-30

    申请号:US15627167

    申请日:2017-06-19

    申请人: Ecolab USA Inc.

    摘要: A process of treating a gas stream containing at least one mercury compound or species, the process comprising: applying a composition into said gas stream ahead of a particulate matter collection device, wherein said composition contains a compound having the following formula (SiO2)x(OH)yMzSaF, wherein (i) SiO2 is an optional component; (ii) M comprises at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; (iii) S comprises a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; (iii) F is an optional component and if present comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01-100%; (iv) the molar ratio of y/x is equal to about 0.01 to about 0.5 and the molar ratio of x/z is equal to about 0.1 to about 300 if SiO2 is present, and if SiO2 is absent X is 0 and Z is 1; and (v) the molar ratio of a/z is about 0.5 to about 5.